Low-loss TiO2 planar waveguides for nanophotonic applications

We deposit TiO 2 planar waveguides on oxidized silicon substrates by reactive sputtering. The films exhibit Raman spectra consistent with an amorphous or anatase phase and have losses as low as 0.4 dB/cm at 826 nm.

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Bibliographic Details
Main Authors: Bradley, J D B, Evans, C C, Parsy, F, Phillips, K C, Senaratne, R, Marti, E, Mazur, E
Format: Conference Proceeding
Language:English
Subjects:
Nonlinear optics
Optical films
Optical variables control
Optical waveguides
Refractive index
Temperature measurement
Online Access:Request full text
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Description
Summary:We deposit TiO 2 planar waveguides on oxidized silicon substrates by reactive sputtering. The films exhibit Raman spectra consistent with an amorphous or anatase phase and have losses as low as 0.4 dB/cm at 826 nm.
ISSN:1092-8081
2766-1733
DOI:10.1109/PHOTONICS.2010.5698885