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Experimental characterization of LIGA fabricated 0.22 THz TWT circuits
In this paper we report precision MEMS Fabrication using novel LIGA technique for 0.22 THz micro-metallic staggered double-vane TWT circuits. For this high aspect ratio structure negative tone photo-resist KMPR was used. The entire fabrication process starting from spin coating, UV-lithography, elec...
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Main Authors: | , , , , , , , |
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Format: | Conference Proceeding |
Language: | eng ; jpn |
Subjects: | |
Online Access: | Request full text |
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Summary: | In this paper we report precision MEMS Fabrication using novel LIGA technique for 0.22 THz micro-metallic staggered double-vane TWT circuits. For this high aspect ratio structure negative tone photo-resist KMPR was used. The entire fabrication process starting from spin coating, UV-lithography, electroforming and mold removal processing was fully characterized. Finally, the high tolerance TWT structure with smoothness (50-80 nm) was aligned in a specially engineered fixture for RF measurements in the BWO range 165-270GHz. The experiment showed excellent transmission 5-8 dB in frequency range 210-265 GHz. This result showed a distinct potential of applying this precision fabrication technique for the mass production of THz sources. |
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DOI: | 10.1109/IVEC.2011.5746982 |