Influence of airborne H2S on haze generation in ArF lithography

Airborne H 2 S contamination exists in cleanroom air, scanner tool environment, and facility CDA. It was confirmed by laser radiation test that H 2 S causes haze formation by reaction with O 3 , and therefore H 2 S in the ArF lithography environment should be controlled in the same way as SO 2 . It...

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Bibliographic Details
Main Authors: Tamaoki, M, Uemura, E, Nishiki, K, Hatano, M, Aiga, F
Format: Conference Proceeding
Language:English
Subjects:
Lithography
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Summary:Airborne H 2 S contamination exists in cleanroom air, scanner tool environment, and facility CDA. It was confirmed by laser radiation test that H 2 S causes haze formation by reaction with O 3 , and therefore H 2 S in the ArF lithography environment should be controlled in the same way as SO 2 . It is necessary to select an adequate chemical filter to remove H 2 S effectively.
ISSN:1523-553X