Electrostatically Confined Plasma in Segmented Hollow Cathode Geometries for Surface Engineering

A segmented hollow cathode (SHC) geometry was used for electrostatic confinement of plasma, and surface engineering treatments were conducted in this arrangement. The assessed processes included plasma nitriding, reactive deposition of sputtered material, and deposition of carbonaceous films by plas...

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Bibliographic Details
Published in:IEEE transactions on plasma science 2011-11, Vol.39 (11), p.3028-3032
Main Authors: Corujeira Gallo, Santiago, Crespi, Ângela E., Cemin, F., Figueroa, C. A., Baumvol, I. J. R.
Format: Article
Language:English
Subjects:
Chemical vapor deposition
Coatings
Confinement
Deposition
Diffraction
Electrodes
Electrostatics
Geometry
Ion nitriding
Materials
Morphology
Plasma confinement
plasma materials processing
Plasma physics
Plasmas
Power supplies
Power supply
Segmented hollow cathodes
Steel
Steels
Surface morphology
Surface treatment
X-rays
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Summary:A segmented hollow cathode (SHC) geometry was used for electrostatic confinement of plasma, and surface engineering treatments were conducted in this arrangement. The assessed processes included plasma nitriding, reactive deposition of sputtered material, and deposition of carbonaceous films by plasma-enhanced chemical vapor deposition with a bipolar pulsed-dc power supply on steel substrates. The treated specimens exhibited uniform surface morphology and deposition layers. Characterization techniques included optical microscopy, scanning electron microscopy with energy dispersive X-ray capability, and X-ray diffraction. The advantages and potential applications of the SHC arrangement are discussed in view of these results.
ISSN:0093-3813
1939-9375
DOI:10.1109/TPS.2011.2141690