Metals-contamination-reduction program for the Varian EHP-220/500 medium-current ion implanter

The results of a program to minimize metals contamination for the Varian EHP-220/500 medium-current ion implanter are presented. Additional graphite and Si-coated shields were added to the beamline and metal contamination associated with 80-kV As/sup +/ implants was measured by SIMS. Total contamina...

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Bibliographic Details
Main Authors: Swenson, D.R., Downey, D.F., Walther, S.R., Renau, A., Gammel, G., Mack, M.E.
Format: Conference Proceeding
Language:English
Subjects:
Atomic measurements
Implants
Iron
Lenses
Magnetic shielding
Pollution measurement
Sputtering
Steel
Structural beams
Surface contamination
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Summary:The results of a program to minimize metals contamination for the Varian EHP-220/500 medium-current ion implanter are presented. Additional graphite and Si-coated shields were added to the beamline and metal contamination associated with 80-kV As/sup +/ implants was measured by SIMS. Total contamination (surface + energetic) was reduced to as low as 28 ppm for Al, 3 ppm for Fe and 2 ppm for Cr. Energetic components of the contamination are consistent with models of knock-on distributions from an 80 kV As/sup +/ implant.
DOI:10.1109/IIT.1996.586154