Smooth and ultra-precise silicon nanowires fabricated by conventional optical lithography

We demonstrate that nanowire waveguides with nanoscale precision and ultra-smooth sidewalls can be fabricated with conventional optical lithography. The presented fabrication scheme exploits the combination of a special staggered lithographic design and preferential wet etching.

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Bibliographic Details
Main Authors: Palmer, R., Alloatti, L., Korn, D., Moosmann, M., Huska, K., Lemmer, U., Gerthsen, D., Schimmel, Th, Freude, W., Koos, C., Leuthold, J.
Format: Conference Proceeding
Language:English
Subjects:
Etching
Fabrication
Lithography
Optical waveguides
Photonics
Silicon
Strips
Online Access:Request full text
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Description
Summary:We demonstrate that nanowire waveguides with nanoscale precision and ultra-smooth sidewalls can be fabricated with conventional optical lithography. The presented fabrication scheme exploits the combination of a special staggered lithographic design and preferential wet etching.
ISSN:2160-8989
2160-9004
DOI:10.1364/CLEO_SI.2011.CThZ1