Scalability Of Plasma Damage With Gate Oxide Thickness

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Bibliographic Details
Main Authors: Bayoumi, A., Shawming Ma, Langley, B., Cox, M., Tavassoli, M., Diaz, C., Min Cao, Marcoux, P., Ray, G., Greene, W.
Format: Conference Proceeding
Language:English
Subjects:
Dielectrics
Electric breakdown
Implants
Plasma applications
Plasma devices
Plasma materials processing
Plasma sources
Scalability
Testing
Tunneling
Online Access:Request full text
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DOI:10.1109/PPID.1997.596669