Design enablement for yield and area optimization at 20 nm and below

There are challenges at 20 nm and below to maintain node to node area reduction and also enable a fast yield ramp and high yield to enable cost scaling. GLOBALFOUNDRIES uses special constructs to reduce cell area along with rule based, model based and pattern based design for manufacturing (feed bac...

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Bibliographic Details
Main Authors: Brotman, A., Capodieci, L., Liu, Bill, Rashed, M., Jongwook Kye, Kengeri, S., Venkatesan, S.
Format: Conference Proceeding
Language:English
Subjects:
Layout
Libraries
Manufacturing
Metrology
Optimization
Predictive models
Process control
Online Access:Request full text
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Summary:There are challenges at 20 nm and below to maintain node to node area reduction and also enable a fast yield ramp and high yield to enable cost scaling. GLOBALFOUNDRIES uses special constructs to reduce cell area along with rule based, model based and pattern based design for manufacturing (feed back from manufacturing to design) and design enabled manufacturing (feed forward from design to manufacturing) in order to achieve these goals.
ISSN:0743-1562