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Photoresponse of Zinc oxide thin-film transistors with location-controlled crystal grains fabricated by low-temperature hydrothermal method
Zinc oxide (ZnO) bottom-gate (BG) thin-film transistors (TFTs) with single vertical grain boundary in the channel have been successfully fabricated by a novel low-temperature (i.e. 85 °C) hydrothermal method. The proposed devices demonstrated the high field-effect mobility of 9.07 cm 2 /V·s, low thr...
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Main Authors: | , , , , , , , , , , |
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Format: | Conference Proceeding |
Language: | English |
Subjects: | |
Online Access: | Request full text |
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Summary: | Zinc oxide (ZnO) bottom-gate (BG) thin-film transistors (TFTs) with single vertical grain boundary in the channel have been successfully fabricated by a novel low-temperature (i.e. 85 °C) hydrothermal method. The proposed devices demonstrated the high field-effect mobility of 9.07 cm 2 /V·s, low threshold voltage of 2.25 V, high on/off current ratio above 10 6 , and superior current drivability, attributed to the high-quality ZnO channel with single grain boundary. Moreover, a stable and repeatable operation of dynamic photoresponse is observed for the location-controlled hydrothermally grown ZnO BG-TFTs. |
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ISSN: | 2159-3523 |
DOI: | 10.1109/INEC.2011.5991667 |