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Fluorine limited reliability of AlInAs/InGaAs high electron mobility transistors with molybdenum gates
A highly reliable AlInAs/InGaAs high electron mobility transistor with the projected lifetime of 10/sup 6/ hours at 125/spl deg/C is developed. The gate electrode sinking is eliminated by adopting molybdenum gate contact metal, and the carrier passivation is controlled by eliminating the extrinsic f...
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creator | Ishida, T. Yamamoto, Y. Hayafuji, N. Miyakuni, S. Hattori, R. Ishikawa, T. Mitsui, Y. |
description | A highly reliable AlInAs/InGaAs high electron mobility transistor with the projected lifetime of 10/sup 6/ hours at 125/spl deg/C is developed. The gate electrode sinking is eliminated by adopting molybdenum gate contact metal, and the carrier passivation is controlled by eliminating the extrinsic fluorine containing processes. The experimental results and theoretical calculation indicate the present reliability is limited by the intrinsic fluorine contamination from the air. |
doi_str_mv | 10.1109/ICIPRM.1997.600093 |
format | conference_proceeding |
fullrecord | <record><control><sourceid>ieee_6IE</sourceid><recordid>TN_cdi_ieee_primary_600093</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>600093</ieee_id><sourcerecordid>600093</sourcerecordid><originalsourceid>FETCH-LOGICAL-i172t-c4708bb72471dfdb020c5ca640b9f24abd3168573edfb06cf9a3d7395d3f4e4b3</originalsourceid><addsrcrecordid>eNotkN9KwzAchQMqOOdeYFd5gW750zbJZRluFiaK6PVIml-2SNpKkiF7ewsbHPguzse5OAgtKVlRStS63bQfn28rqpRY1YQQxe_QQglJpnAulWT3aDaJrJB1rR7RU0o_k1YJJmfIbcN5jH4AHHzvM1gcIXhtfPD5gkeHm9AOTVq3w043CZ_88YQhQJfjOOB-vHk56iH5lMeY8J_Pp6kJF2NhOPf4qDOkZ_TgdEiwuHGOvrcvX5vXYv--azfNvvBUsFx0pSDSGMFKQa2zhjDSVZ2uS2KUY6U2ltNaVoKDdYbUnVOaW8FVZbkroTR8jpbXXQ8Ah9_oex0vh-sr_B-GSlj5</addsrcrecordid><sourcetype>Publisher</sourcetype><iscdi>true</iscdi><recordtype>conference_proceeding</recordtype></control><display><type>conference_proceeding</type><title>Fluorine limited reliability of AlInAs/InGaAs high electron mobility transistors with molybdenum gates</title><source>IEEE Electronic Library (IEL) Conference Proceedings</source><creator>Ishida, T. ; Yamamoto, Y. ; Hayafuji, N. ; Miyakuni, S. ; Hattori, R. ; Ishikawa, T. ; Mitsui, Y.</creator><creatorcontrib>Ishida, T. ; Yamamoto, Y. ; Hayafuji, N. ; Miyakuni, S. ; Hattori, R. ; Ishikawa, T. ; Mitsui, Y.</creatorcontrib><description>A highly reliable AlInAs/InGaAs high electron mobility transistor with the projected lifetime of 10/sup 6/ hours at 125/spl deg/C is developed. The gate electrode sinking is eliminated by adopting molybdenum gate contact metal, and the carrier passivation is controlled by eliminating the extrinsic fluorine containing processes. The experimental results and theoretical calculation indicate the present reliability is limited by the intrinsic fluorine contamination from the air.</description><identifier>ISSN: 1092-8669</identifier><identifier>ISBN: 9780780338982</identifier><identifier>ISBN: 0780338987</identifier><identifier>DOI: 10.1109/ICIPRM.1997.600093</identifier><language>eng</language><publisher>IEEE</publisher><subject>Contamination ; Degradation ; Electrodes ; Failure analysis ; HEMTs ; Indium gallium arsenide ; Life estimation ; Life testing ; Microwave transistors ; MODFETs</subject><ispartof>Conference Proceedings. 1997 International Conference on Indium Phosphide and Related Materials, 1997, p.201-204</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/600093$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,780,784,789,790,2058,4050,4051,27925,54555,54920,54932</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/600093$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Ishida, T.</creatorcontrib><creatorcontrib>Yamamoto, Y.</creatorcontrib><creatorcontrib>Hayafuji, N.</creatorcontrib><creatorcontrib>Miyakuni, S.</creatorcontrib><creatorcontrib>Hattori, R.</creatorcontrib><creatorcontrib>Ishikawa, T.</creatorcontrib><creatorcontrib>Mitsui, Y.</creatorcontrib><title>Fluorine limited reliability of AlInAs/InGaAs high electron mobility transistors with molybdenum gates</title><title>Conference Proceedings. 1997 International Conference on Indium Phosphide and Related Materials</title><addtitle>ICIPRM</addtitle><description>A highly reliable AlInAs/InGaAs high electron mobility transistor with the projected lifetime of 10/sup 6/ hours at 125/spl deg/C is developed. The gate electrode sinking is eliminated by adopting molybdenum gate contact metal, and the carrier passivation is controlled by eliminating the extrinsic fluorine containing processes. The experimental results and theoretical calculation indicate the present reliability is limited by the intrinsic fluorine contamination from the air.</description><subject>Contamination</subject><subject>Degradation</subject><subject>Electrodes</subject><subject>Failure analysis</subject><subject>HEMTs</subject><subject>Indium gallium arsenide</subject><subject>Life estimation</subject><subject>Life testing</subject><subject>Microwave transistors</subject><subject>MODFETs</subject><issn>1092-8669</issn><isbn>9780780338982</isbn><isbn>0780338987</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>1997</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><recordid>eNotkN9KwzAchQMqOOdeYFd5gW750zbJZRluFiaK6PVIml-2SNpKkiF7ewsbHPguzse5OAgtKVlRStS63bQfn28rqpRY1YQQxe_QQglJpnAulWT3aDaJrJB1rR7RU0o_k1YJJmfIbcN5jH4AHHzvM1gcIXhtfPD5gkeHm9AOTVq3w043CZ_88YQhQJfjOOB-vHk56iH5lMeY8J_Pp6kJF2NhOPf4qDOkZ_TgdEiwuHGOvrcvX5vXYv--azfNvvBUsFx0pSDSGMFKQa2zhjDSVZ2uS2KUY6U2ltNaVoKDdYbUnVOaW8FVZbkroTR8jpbXXQ8Ah9_oex0vh-sr_B-GSlj5</recordid><startdate>1997</startdate><enddate>1997</enddate><creator>Ishida, T.</creator><creator>Yamamoto, Y.</creator><creator>Hayafuji, N.</creator><creator>Miyakuni, S.</creator><creator>Hattori, R.</creator><creator>Ishikawa, T.</creator><creator>Mitsui, Y.</creator><general>IEEE</general><scope>6IE</scope><scope>6IL</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIL</scope></search><sort><creationdate>1997</creationdate><title>Fluorine limited reliability of AlInAs/InGaAs high electron mobility transistors with molybdenum gates</title><author>Ishida, T. ; Yamamoto, Y. ; Hayafuji, N. ; Miyakuni, S. ; Hattori, R. ; Ishikawa, T. ; Mitsui, Y.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i172t-c4708bb72471dfdb020c5ca640b9f24abd3168573edfb06cf9a3d7395d3f4e4b3</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>1997</creationdate><topic>Contamination</topic><topic>Degradation</topic><topic>Electrodes</topic><topic>Failure analysis</topic><topic>HEMTs</topic><topic>Indium gallium arsenide</topic><topic>Life estimation</topic><topic>Life testing</topic><topic>Microwave transistors</topic><topic>MODFETs</topic><toplevel>online_resources</toplevel><creatorcontrib>Ishida, T.</creatorcontrib><creatorcontrib>Yamamoto, Y.</creatorcontrib><creatorcontrib>Hayafuji, N.</creatorcontrib><creatorcontrib>Miyakuni, S.</creatorcontrib><creatorcontrib>Hattori, R.</creatorcontrib><creatorcontrib>Ishikawa, T.</creatorcontrib><creatorcontrib>Mitsui, Y.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan All Online (POP All Online) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEL</collection><collection>IEEE Proceedings Order Plans (POP All) 1998-Present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Ishida, T.</au><au>Yamamoto, Y.</au><au>Hayafuji, N.</au><au>Miyakuni, S.</au><au>Hattori, R.</au><au>Ishikawa, T.</au><au>Mitsui, Y.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Fluorine limited reliability of AlInAs/InGaAs high electron mobility transistors with molybdenum gates</atitle><btitle>Conference Proceedings. 1997 International Conference on Indium Phosphide and Related Materials</btitle><stitle>ICIPRM</stitle><date>1997</date><risdate>1997</risdate><spage>201</spage><epage>204</epage><pages>201-204</pages><issn>1092-8669</issn><isbn>9780780338982</isbn><isbn>0780338987</isbn><abstract>A highly reliable AlInAs/InGaAs high electron mobility transistor with the projected lifetime of 10/sup 6/ hours at 125/spl deg/C is developed. The gate electrode sinking is eliminated by adopting molybdenum gate contact metal, and the carrier passivation is controlled by eliminating the extrinsic fluorine containing processes. The experimental results and theoretical calculation indicate the present reliability is limited by the intrinsic fluorine contamination from the air.</abstract><pub>IEEE</pub><doi>10.1109/ICIPRM.1997.600093</doi><tpages>4</tpages></addata></record> |
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ispartof | Conference Proceedings. 1997 International Conference on Indium Phosphide and Related Materials, 1997, p.201-204 |
issn | 1092-8669 |
language | eng |
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source | IEEE Electronic Library (IEL) Conference Proceedings |
subjects | Contamination Degradation Electrodes Failure analysis HEMTs Indium gallium arsenide Life estimation Life testing Microwave transistors MODFETs |
title | Fluorine limited reliability of AlInAs/InGaAs high electron mobility transistors with molybdenum gates |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-04T12%3A32%3A52IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-ieee_6IE&rft_val_fmt=info:ofi/fmt:kev:mtx:book&rft.genre=proceeding&rft.atitle=Fluorine%20limited%20reliability%20of%20AlInAs/InGaAs%20high%20electron%20mobility%20transistors%20with%20molybdenum%20gates&rft.btitle=Conference%20Proceedings.%201997%20International%20Conference%20on%20Indium%20Phosphide%20and%20Related%20Materials&rft.au=Ishida,%20T.&rft.date=1997&rft.spage=201&rft.epage=204&rft.pages=201-204&rft.issn=1092-8669&rft.isbn=9780780338982&rft.isbn_list=0780338987&rft_id=info:doi/10.1109/ICIPRM.1997.600093&rft_dat=%3Cieee_6IE%3E600093%3C/ieee_6IE%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-i172t-c4708bb72471dfdb020c5ca640b9f24abd3168573edfb06cf9a3d7395d3f4e4b3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_id=info:pmid/&rft_ieee_id=600093&rfr_iscdi=true |