Uniform field emission from polycrystalline CVD-diamond films

We have systematically investigated the electron emission of various kinds of polycrystalline CVD-diamond films by means of a Field Emission Scanning Microscope with /spl mu/m resolution, which contains an in situ scanning electron microscope. Besides the previously reported enhanced field emission...

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Bibliographic Details
Main Authors: Habermann, T., Gohl, A., Muller, G., Pupeter, N., Piel, H., Aschermann, B., Raiko, V., Spitzl, R., Engemann, J.
Format: Conference Proceeding
Language:English
Subjects:
Chemical vapor deposition
Conducting materials
Electric variables measurement
Electron emission
Electron sources
Iron
Pollution measurement
Scanning electron microscopy
Surface contamination
Thermal conductivity
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Summary:We have systematically investigated the electron emission of various kinds of polycrystalline CVD-diamond films by means of a Field Emission Scanning Microscope with /spl mu/m resolution, which contains an in situ scanning electron microscope. Besides the previously reported enhanced field emission from particulate contamination and other surface irregularities at electric fields between 2.5 and 150 MV/m, an almost uniform emission over the film surface was detected on all samples at applied electric fields above 220 MV/m. The pure p-doped Si-100-substrate requires, in comparison, much higher fields for electron emission. Field emission at electric fields as low as 70 MV/m was achieved from Si-dots covered with diamond-caps. The comparison of high-resolution line scans with model calculations strongly suggests the observed intrinsic field emission of CVD-diamond combined with geometrical field enhancement as responsible emission mechanism of these structures.
DOI:10.1109/IVMC.1996.601820