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Experimental extraction of the base resistance of SiGe:C HBTs beyond BVCEO: An improved technique
In this work, we present an extended version of a dc method to experimentally evaluate the base resistance R B of bipolar transistors as a function of the biasing conditions. In particular, the approach allows accurately monitoring the R B increase with collector voltage beyond the open-base breakdo...
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Main Authors: | , , , , , , , |
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Format: | Conference Proceeding |
Language: | English |
Subjects: | |
Online Access: | Request full text |
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Summary: | In this work, we present an extended version of a dc method to experimentally evaluate the base resistance R B of bipolar transistors as a function of the biasing conditions. In particular, the approach allows accurately monitoring the R B increase with collector voltage beyond the open-base breakdown voltage BV CEO up to the pinch-in occurrence. The method is successfully applied to state-of-the-art HF SiGe:C heterojunction bipolar transistors (HBTs). |
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ISSN: | 1088-9299 2378-590X |
DOI: | 10.1109/BCTM.2011.6082778 |