Characterization of Ti-O-N films deposited on Ti-Ta-Nb substrate by plasma laser deposition

In present days in-depth behaviour characterization of multifunctional deposited films for MEMS/BIO-MEMS applications, showed the need of adequate properties, in order to assure the demanded designed functions for envisaged applications, such as: physical, chemical, mechanical, tribological and bioc...

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Bibliographic Details
Main Authors: Cojocaru, V., Raducanu, D., Scarisoreanu, N. D., Cinca, I.
Format: Conference Proceeding
Language:English
Subjects:
Optical films
Plasma Laser Deposition
Substrates
Surface morphology
Surface treatment
Ti-O-N films
X-ray diffraction
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Summary:In present days in-depth behaviour characterization of multifunctional deposited films for MEMS/BIO-MEMS applications, showed the need of adequate properties, in order to assure the demanded designed functions for envisaged applications, such as: physical, chemical, mechanical, tribological and biocompatible. The development of new materials for films deposition with high potential to be used in BIO-MEMS applications is a goal at national an international level. Recently, a new class of deposition materials consist in metal-oxy-nitrides Me-O-N (Me - transition metal) has been started to be investigated, because has been showed that the oxygen presence has as effect obtaining of mixture of specific properties for both nitrides (Me-N) and oxides (Me-O). A way to tailor the specific properties for deposited film consist in modifying the ratio O/N, in this way the deposited film specific properties are directed more towards to oxides/nitrides properties. In this paper partially data concerning O/N ratio influence upon films characteristics are presented.
ISSN:1545-827X
2377-0678
DOI:10.1109/SMICND.2011.6095787