Low loss waveguide integration within a thin-SOI CMOS foundry

By requiring zero process changes and by complying with established electronic circuit design rules, photonic devices formed with 3dB/cm waveguides were fabricated alongside transistors achieving 4ps stage delay in a 45nm thin-SOI CMOS foundry.

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Bibliographic Details
Main Authors: Orcutt, J. S., Moss, B., Chen Sun, Leu, J., Georgas, M., Urosevic, S., Hanqing Li, Jie Sun, Weaver, M., Zgraggen, E., Ram, R. J., Stojanovic, V., Shainline, J., Popovic, M.
Format: Conference Proceeding
Language:English
Subjects:
CMOS integrated circuits
CMOS process
CMOS technology
Foundries
Optical waveguides
Photonics
Silicon
Transistors
Online Access:Request full text
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Description
Summary:By requiring zero process changes and by complying with established electronic circuit design rules, photonic devices formed with 3dB/cm waveguides were fabricated alongside transistors achieving 4ps stage delay in a 45nm thin-SOI CMOS foundry.
ISSN:2376-8665
DOI:10.1109/OIC.2012.6224465