Defect tolerant extreme ultraviolet lithography

We report on defect tolerant, extreme ultraviolet (EUV) lithography technique. We envision that our technique will impact both the quality and the cost of nano-fabrication with coherent EUV light.

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Bibliographic Details
Main Authors: Urbanski, L., Isoyan, A., Stein, A., Rocca, J., Menoni, C., Marconi, M. C.
Format: Conference Proceeding
Language:English
Subjects:
Atomic force microscopy
Lithography
Resists
Scanning electron microscopy
Tiles
Ultraviolet sources
Online Access:Request full text
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Description
Summary:We report on defect tolerant, extreme ultraviolet (EUV) lithography technique. We envision that our technique will impact both the quality and the cost of nano-fabrication with coherent EUV light.
ISSN:2160-8989
2160-9004