Quick deposition of various thin films by intense pulsed ion beam

A high-density, high-temperature, ablation plasma has been efficiently produced by the irradiation of an intense pulsed ion beam onto solid targets. Properties of such the target plasma has been diagnosed by using time-resolved spectroscopy and high speed photography. Electron temperature and densit...

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Bibliographic Details
Main Authors: Masugata, K., Sonegawa, T., Ohashi, M., Hoshino, H., Shimotori, Y., Furuuchi, S., Yamamoto, H., Ono, T., Mito, M., Sato, H., Hatsushika, T., Suzuki, T., Takaai, T., Yatsui, K.
Format: Conference Proceeding
Language:English
Subjects:
Anodes
Particle beams
Plasma measurements
Plasma temperature
Substrates
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Summary:A high-density, high-temperature, ablation plasma has been efficiently produced by the irradiation of an intense pulsed ion beam onto solid targets. Properties of such the target plasma has been diagnosed by using time-resolved spectroscopy and high speed photography. Electron temperature and density of the plasma was estimated to be ~ 0.8 eV and ~ 10 18 cm -3 , respectively. By using such the ablation plasma, we have succeeded to prepare very quickly various kinds of thin films such as electroluminescent layer of ZnS, superconductive film of Y 1 Ba 2 Cu 3 O 7-x , and high dielectric constant material of BaTiO 3 .