At speed HTOL test for reliability qualification of high speed mobile applications

In this paper, intuition is given on the Vmin shift behaviors under high speed frequency high temperature operating life (HTOL) stress conditions on Dual- and Quad-Core Application Processors (AP) fabricated with advanced High-k/Metal-gate (HK/MG) process. Unlike a constant frequency at 1 MHz, At Sp...

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Bibliographic Details
Main Authors: Jongwoo Park, Da Ahn, Donghee Lee, Jang, E.-S, Wooyeon Kim, Sangchul Shin, Gunrae Kim, Nae-In Lee, Sangwoo Pae
Format: Conference Proceeding
Language:English
Subjects:
application processor
Ash
at speed HTOL
High-k
Integrated circuit reliability
IP networks
Reliability engineering
reliability qualification
Stress
Vmin
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Summary:In this paper, intuition is given on the Vmin shift behaviors under high speed frequency high temperature operating life (HTOL) stress conditions on Dual- and Quad-Core Application Processors (AP) fabricated with advanced High-k/Metal-gate (HK/MG) process. Unlike a constant frequency at 1 MHz, At Speed HTOL (ASH) stress tests over 1.5 GHz enables pragmatic Vmin trends. ASH Vmin results represent more realistic Vmin-shift from the viewpoint of both reliability stress and prediction of field EOL. We'll discuss Vmin shift results on ASH and its perspective as the current and future qualification tool for high speed mobile applications.
ISSN:1541-7026
1938-1891
DOI:10.1109/IRPS.2013.6531995