Loading…

A Glass-in-Silicon Reflow Process for Three-Dimensional Microsystems

This paper reports a new batch-mode fabrication process that combines glass and silicon into a single wafer. The technique requires only a single mask to lithographically define recesses in silicon using deep reactive ion etching. The patterned silicon wafer is anodically bonded to a glass wafer, an...

Full description

Saved in:
Bibliographic Details
Published in:Journal of microelectromechanical systems 2013-12, Vol.22 (6), p.1470-1477
Main Authors: Haque, Razi-ul M., Wise, Kensall D.
Format: Article
Language:English
Subjects:
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:This paper reports a new batch-mode fabrication process that combines glass and silicon into a single wafer. The technique requires only a single mask to lithographically define recesses in silicon using deep reactive ion etching. The patterned silicon wafer is anodically bonded to a glass wafer, and a high-temperature step reflows the glass into this silicon mold. The reflowed wafer stack is then planarized and thinned. Through-glass vias can be realized in this manner while additional process-flow modifications enable features such as molded cavities in the glass. A capacitive pressure sensor and a hermetically sealed resonator are described to illustrate applications of the process. Finally, a three dimensional packaging technique for implantable biomedical microsystems is shown by vertically stacking glass-in-silicon wafers.
ISSN:1057-7157
1941-0158
DOI:10.1109/JMEMS.2013.2265851