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A Glass-in-Silicon Reflow Process for Three-Dimensional Microsystems
This paper reports a new batch-mode fabrication process that combines glass and silicon into a single wafer. The technique requires only a single mask to lithographically define recesses in silicon using deep reactive ion etching. The patterned silicon wafer is anodically bonded to a glass wafer, an...
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Published in: | Journal of microelectromechanical systems 2013-12, Vol.22 (6), p.1470-1477 |
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Main Authors: | , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | This paper reports a new batch-mode fabrication process that combines glass and silicon into a single wafer. The technique requires only a single mask to lithographically define recesses in silicon using deep reactive ion etching. The patterned silicon wafer is anodically bonded to a glass wafer, and a high-temperature step reflows the glass into this silicon mold. The reflowed wafer stack is then planarized and thinned. Through-glass vias can be realized in this manner while additional process-flow modifications enable features such as molded cavities in the glass. A capacitive pressure sensor and a hermetically sealed resonator are described to illustrate applications of the process. Finally, a three dimensional packaging technique for implantable biomedical microsystems is shown by vertically stacking glass-in-silicon wafers. |
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ISSN: | 1057-7157 1941-0158 |
DOI: | 10.1109/JMEMS.2013.2265851 |