Sputter deposition of stress controlled piezoelectric AlN and AlScN films for ultrasonic and energy harvesting applications

This paper will report on the deposition and characterization of piezoelectric AlN and Al x Sc 1-x N layers. A special focus is on the characterization regarding the mechanical stress in the films. Potential applications of the films are in ultrasonic microscopy, energy harvesting and SAW/BAW filter...

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Bibliographic Details
Main Authors: Barth, Stephan, Bartzsch, Hagen, Gloess, Daniel, Frach, Peter, Herzog, Thomas, Walter, Susan, Heuer, Henning
Format: Conference Proceeding
Language:English
Subjects:
Acoustics
AlN
AlScN
III-V semiconductor materials
piezoelectric
Sputter Deposition
Sputtering
Stress
Stress Control
Substrates
X-ray scattering
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Description
Summary:This paper will report on the deposition and characterization of piezoelectric AlN and Al x Sc 1-x N layers. A special focus is on the characterization regarding the mechanical stress in the films. Potential applications of the films are in ultrasonic microscopy, energy harvesting and SAW/BAW filters. To demonstrate the potential in ultrasonic applications, the pulse echo method was used.
ISSN:1051-0117
DOI:10.1109/ULTSYM.2013.0344