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Development of a Gas-Fed Plasma Source for Pulsed High-Density Plasma/Material Interaction Studies
A gas-fed capillary plasma source has been developed to study plasma-surface interactions under pulsed high pressure arc conditions, without the use of an exploding fuse wire or ablative liner. A nonintrusive preionization source has been developed to break down relatively large interelectrode gaps...
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Published in: | IEEE transactions on plasma science 2014-10, Vol.42 (10), p.3245-3252 |
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container_issue | 10 |
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container_title | IEEE transactions on plasma science |
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creator | Pachuilo, Michael V. Stefani, Francis Raja, Laxminarayan L. Bengtson, Roger D. Henkelman, Graeme A. Tas, A. Cuneyt Kriven, Waltraud M. Suraj, Kumar Sinha |
description | A gas-fed capillary plasma source has been developed to study plasma-surface interactions under pulsed high pressure arc conditions, without the use of an exploding fuse wire or ablative liner. A nonintrusive preionization source has been developed to break down relatively large interelectrode gaps at low charge voltages of 2-6 kV. The preionization source comprises a nonequilibrium surface streamer discharge that forms a conducting channel through which the main thermal arc discharge is initiated. The arc electron temperature and number density are estimated to be T e ~ 1-2 eV and n e ~ 10 23 m -3 . Silicon and sapphire samples were exposed to the arc plasma and revealed deposition of electrode and wall materials. Substitution of Elkonite 50W3 for brass electrodes reduced plasma contamination to acceptable levels. The plasma-material interactions were examined and quantified using scanning electron microscopy and energy dispersive X-ray spectroscopy. |
doi_str_mv | 10.1109/TPS.2014.2344974 |
format | article |
fullrecord | <record><control><sourceid>proquest_ieee_</sourceid><recordid>TN_cdi_ieee_primary_6877676</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>6877676</ieee_id><sourcerecordid>3496432431</sourcerecordid><originalsourceid>FETCH-LOGICAL-c436t-8496bd581b5a3445fb8a58ab96a44c0ab98bf19fea62c63a5d5cbcaf41c191fd3</originalsourceid><addsrcrecordid>eNpdkM1LAzEQxYMoWKt3wUvAi5dtk83Hbo7S2laoWGg9h9lsolu2m7rZFfrfm9LiwdM8mN8b5j2E7ikZUUrUeLNaj1JC-ShlnKuMX6ABVUwlimXiEg0IUSxhOWXX6CaELYmkIOkAFVP7Y2u_39mmw95hwHMIycyWeFVD2AFe-741Fjvf4lVfh7hYVJ9fydQ2oeoOZ2r8Bp1tK6jxaxMFmK7yDV53fVnZcIuuHETn3XkO0cfsZTNZJMv3-evkeZkYzmSX5FzJohQ5LQTECMIVOYgcCiWBc0OiyAtHlbMgUyMZiFKYwoDj1FBFXcmG6Ol0d9_6796GTu-qYGxdQ2N9HzTNFEtzIomM6OM_dBtjNvE7TWUqKKNMkkiRE2VaH0Jrnd631Q7ag6ZEH0vXsXR9LF2fS4-Wh5Olstb-4TLPMplJ9gtGVX17</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1625131360</pqid></control><display><type>article</type><title>Development of a Gas-Fed Plasma Source for Pulsed High-Density Plasma/Material Interaction Studies</title><source>IEEE Xplore (Online service)</source><creator>Pachuilo, Michael V. ; Stefani, Francis ; Raja, Laxminarayan L. ; Bengtson, Roger D. ; Henkelman, Graeme A. ; Tas, A. Cuneyt ; Kriven, Waltraud M. ; Suraj, Kumar Sinha</creator><creatorcontrib>Pachuilo, Michael V. ; Stefani, Francis ; Raja, Laxminarayan L. ; Bengtson, Roger D. ; Henkelman, Graeme A. ; Tas, A. Cuneyt ; Kriven, Waltraud M. ; Suraj, Kumar Sinha</creatorcontrib><description>A gas-fed capillary plasma source has been developed to study plasma-surface interactions under pulsed high pressure arc conditions, without the use of an exploding fuse wire or ablative liner. A nonintrusive preionization source has been developed to break down relatively large interelectrode gaps at low charge voltages of 2-6 kV. The preionization source comprises a nonequilibrium surface streamer discharge that forms a conducting channel through which the main thermal arc discharge is initiated. The arc electron temperature and number density are estimated to be T e ~ 1-2 eV and n e ~ 10 23 m -3 . Silicon and sapphire samples were exposed to the arc plasma and revealed deposition of electrode and wall materials. Substitution of Elkonite 50W3 for brass electrodes reduced plasma contamination to acceptable levels. The plasma-material interactions were examined and quantified using scanning electron microscopy and energy dispersive X-ray spectroscopy.</description><identifier>ISSN: 0093-3813</identifier><identifier>EISSN: 1939-9375</identifier><identifier>DOI: 10.1109/TPS.2014.2344974</identifier><identifier>CODEN: ITPSBD</identifier><language>eng</language><publisher>New York: IEEE</publisher><subject>Ablation ; Arc discharge ; Argon ; atmospheric discharge ; Capacitors ; capillary discharge ; Channels ; Charge ; Density ; Discharges (electric) ; Electric potential ; Electrodes ; Electron tubes ; Fuses ; Gases ; Plasma physics ; plasma-material interaction ; Plasmas ; Preionization ; pulsed thermal plasma ; Scanning electron microscopy ; Spectrum analysis</subject><ispartof>IEEE transactions on plasma science, 2014-10, Vol.42 (10), p.3245-3252</ispartof><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) Oct 2014</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c436t-8496bd581b5a3445fb8a58ab96a44c0ab98bf19fea62c63a5d5cbcaf41c191fd3</citedby><cites>FETCH-LOGICAL-c436t-8496bd581b5a3445fb8a58ab96a44c0ab98bf19fea62c63a5d5cbcaf41c191fd3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/6877676$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,780,784,27924,27925,54796</link.rule.ids></links><search><creatorcontrib>Pachuilo, Michael V.</creatorcontrib><creatorcontrib>Stefani, Francis</creatorcontrib><creatorcontrib>Raja, Laxminarayan L.</creatorcontrib><creatorcontrib>Bengtson, Roger D.</creatorcontrib><creatorcontrib>Henkelman, Graeme A.</creatorcontrib><creatorcontrib>Tas, A. Cuneyt</creatorcontrib><creatorcontrib>Kriven, Waltraud M.</creatorcontrib><creatorcontrib>Suraj, Kumar Sinha</creatorcontrib><title>Development of a Gas-Fed Plasma Source for Pulsed High-Density Plasma/Material Interaction Studies</title><title>IEEE transactions on plasma science</title><addtitle>TPS</addtitle><description>A gas-fed capillary plasma source has been developed to study plasma-surface interactions under pulsed high pressure arc conditions, without the use of an exploding fuse wire or ablative liner. A nonintrusive preionization source has been developed to break down relatively large interelectrode gaps at low charge voltages of 2-6 kV. The preionization source comprises a nonequilibrium surface streamer discharge that forms a conducting channel through which the main thermal arc discharge is initiated. The arc electron temperature and number density are estimated to be T e ~ 1-2 eV and n e ~ 10 23 m -3 . Silicon and sapphire samples were exposed to the arc plasma and revealed deposition of electrode and wall materials. Substitution of Elkonite 50W3 for brass electrodes reduced plasma contamination to acceptable levels. The plasma-material interactions were examined and quantified using scanning electron microscopy and energy dispersive X-ray spectroscopy.</description><subject>Ablation</subject><subject>Arc discharge</subject><subject>Argon</subject><subject>atmospheric discharge</subject><subject>Capacitors</subject><subject>capillary discharge</subject><subject>Channels</subject><subject>Charge</subject><subject>Density</subject><subject>Discharges (electric)</subject><subject>Electric potential</subject><subject>Electrodes</subject><subject>Electron tubes</subject><subject>Fuses</subject><subject>Gases</subject><subject>Plasma physics</subject><subject>plasma-material interaction</subject><subject>Plasmas</subject><subject>Preionization</subject><subject>pulsed thermal plasma</subject><subject>Scanning electron microscopy</subject><subject>Spectrum analysis</subject><issn>0093-3813</issn><issn>1939-9375</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2014</creationdate><recordtype>article</recordtype><recordid>eNpdkM1LAzEQxYMoWKt3wUvAi5dtk83Hbo7S2laoWGg9h9lsolu2m7rZFfrfm9LiwdM8mN8b5j2E7ikZUUrUeLNaj1JC-ShlnKuMX6ABVUwlimXiEg0IUSxhOWXX6CaELYmkIOkAFVP7Y2u_39mmw95hwHMIycyWeFVD2AFe-741Fjvf4lVfh7hYVJ9fydQ2oeoOZ2r8Bp1tK6jxaxMFmK7yDV53fVnZcIuuHETn3XkO0cfsZTNZJMv3-evkeZkYzmSX5FzJohQ5LQTECMIVOYgcCiWBc0OiyAtHlbMgUyMZiFKYwoDj1FBFXcmG6Ol0d9_6796GTu-qYGxdQ2N9HzTNFEtzIomM6OM_dBtjNvE7TWUqKKNMkkiRE2VaH0Jrnd631Q7ag6ZEH0vXsXR9LF2fS4-Wh5Olstb-4TLPMplJ9gtGVX17</recordid><startdate>20141001</startdate><enddate>20141001</enddate><creator>Pachuilo, Michael V.</creator><creator>Stefani, Francis</creator><creator>Raja, Laxminarayan L.</creator><creator>Bengtson, Roger D.</creator><creator>Henkelman, Graeme A.</creator><creator>Tas, A. Cuneyt</creator><creator>Kriven, Waltraud M.</creator><creator>Suraj, Kumar Sinha</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>L7M</scope><scope>F28</scope><scope>FR3</scope></search><sort><creationdate>20141001</creationdate><title>Development of a Gas-Fed Plasma Source for Pulsed High-Density Plasma/Material Interaction Studies</title><author>Pachuilo, Michael V. ; Stefani, Francis ; Raja, Laxminarayan L. ; Bengtson, Roger D. ; Henkelman, Graeme A. ; Tas, A. Cuneyt ; Kriven, Waltraud M. ; Suraj, Kumar Sinha</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c436t-8496bd581b5a3445fb8a58ab96a44c0ab98bf19fea62c63a5d5cbcaf41c191fd3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2014</creationdate><topic>Ablation</topic><topic>Arc discharge</topic><topic>Argon</topic><topic>atmospheric discharge</topic><topic>Capacitors</topic><topic>capillary discharge</topic><topic>Channels</topic><topic>Charge</topic><topic>Density</topic><topic>Discharges (electric)</topic><topic>Electric potential</topic><topic>Electrodes</topic><topic>Electron tubes</topic><topic>Fuses</topic><topic>Gases</topic><topic>Plasma physics</topic><topic>plasma-material interaction</topic><topic>Plasmas</topic><topic>Preionization</topic><topic>pulsed thermal plasma</topic><topic>Scanning electron microscopy</topic><topic>Spectrum analysis</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Pachuilo, Michael V.</creatorcontrib><creatorcontrib>Stefani, Francis</creatorcontrib><creatorcontrib>Raja, Laxminarayan L.</creatorcontrib><creatorcontrib>Bengtson, Roger D.</creatorcontrib><creatorcontrib>Henkelman, Graeme A.</creatorcontrib><creatorcontrib>Tas, A. Cuneyt</creatorcontrib><creatorcontrib>Kriven, Waltraud M.</creatorcontrib><creatorcontrib>Suraj, Kumar Sinha</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005–Present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEL</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>ANTE: Abstracts in New Technology & Engineering</collection><collection>Engineering Research Database</collection><jtitle>IEEE transactions on plasma science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Pachuilo, Michael V.</au><au>Stefani, Francis</au><au>Raja, Laxminarayan L.</au><au>Bengtson, Roger D.</au><au>Henkelman, Graeme A.</au><au>Tas, A. Cuneyt</au><au>Kriven, Waltraud M.</au><au>Suraj, Kumar Sinha</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Development of a Gas-Fed Plasma Source for Pulsed High-Density Plasma/Material Interaction Studies</atitle><jtitle>IEEE transactions on plasma science</jtitle><stitle>TPS</stitle><date>2014-10-01</date><risdate>2014</risdate><volume>42</volume><issue>10</issue><spage>3245</spage><epage>3252</epage><pages>3245-3252</pages><issn>0093-3813</issn><eissn>1939-9375</eissn><coden>ITPSBD</coden><abstract>A gas-fed capillary plasma source has been developed to study plasma-surface interactions under pulsed high pressure arc conditions, without the use of an exploding fuse wire or ablative liner. A nonintrusive preionization source has been developed to break down relatively large interelectrode gaps at low charge voltages of 2-6 kV. The preionization source comprises a nonequilibrium surface streamer discharge that forms a conducting channel through which the main thermal arc discharge is initiated. The arc electron temperature and number density are estimated to be T e ~ 1-2 eV and n e ~ 10 23 m -3 . Silicon and sapphire samples were exposed to the arc plasma and revealed deposition of electrode and wall materials. Substitution of Elkonite 50W3 for brass electrodes reduced plasma contamination to acceptable levels. The plasma-material interactions were examined and quantified using scanning electron microscopy and energy dispersive X-ray spectroscopy.</abstract><cop>New York</cop><pub>IEEE</pub><doi>10.1109/TPS.2014.2344974</doi><tpages>8</tpages><oa>free_for_read</oa></addata></record> |
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subjects | Ablation Arc discharge Argon atmospheric discharge Capacitors capillary discharge Channels Charge Density Discharges (electric) Electric potential Electrodes Electron tubes Fuses Gases Plasma physics plasma-material interaction Plasmas Preionization pulsed thermal plasma Scanning electron microscopy Spectrum analysis |
title | Development of a Gas-Fed Plasma Source for Pulsed High-Density Plasma/Material Interaction Studies |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-25T15%3A09%3A52IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_ieee_&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Development%20of%20a%20Gas-Fed%20Plasma%20Source%20for%20Pulsed%20High-Density%20Plasma/Material%20Interaction%20Studies&rft.jtitle=IEEE%20transactions%20on%20plasma%20science&rft.au=Pachuilo,%20Michael%20V.&rft.date=2014-10-01&rft.volume=42&rft.issue=10&rft.spage=3245&rft.epage=3252&rft.pages=3245-3252&rft.issn=0093-3813&rft.eissn=1939-9375&rft.coden=ITPSBD&rft_id=info:doi/10.1109/TPS.2014.2344974&rft_dat=%3Cproquest_ieee_%3E3496432431%3C/proquest_ieee_%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c436t-8496bd581b5a3445fb8a58ab96a44c0ab98bf19fea62c63a5d5cbcaf41c191fd3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=1625131360&rft_id=info:pmid/&rft_ieee_id=6877676&rfr_iscdi=true |