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A MOS Parametric Integrator With Improved Linearity for SC \Sigma\Delta Modulators
This brief presents a double complimentary metal- oxide-semiconductor (MOS) parametric integrator (DCMPI) with improved linearity characteristics for wideband switched-capacitor sigma-delta (ΣΔ) modulators. Compared with the MOS parametric integrator [1], the proposed circuit achieves similar power,...
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Published in: | IEEE transactions on circuits and systems. II, Express briefs Express briefs, 2015-03, Vol.62 (3), p.231-235 |
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Main Authors: | , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | This brief presents a double complimentary metal- oxide-semiconductor (MOS) parametric integrator (DCMPI) with improved linearity characteristics for wideband switched-capacitor sigma-delta (ΣΔ) modulators. Compared with the MOS parametric integrator [1], the proposed circuit achieves similar power, noise, and speed performance, while its linearity characteristics and transfer function are improved. The main nonideality improvements in the proposed DCMPI are presented through the mathematical formulas and verified through the postlayout simulations performed in the Spectre/Cadence electrical simulator using the BSIM3v3 complementary MOS (CMOS) model in the standard 0.18-μm CMOS process. |
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ISSN: | 1549-7747 1558-3791 |
DOI: | 10.1109/TCSII.2014.2368971 |