Mis-structures with nanoscale dielectric films of the rare-earth metal-alloyed silicon nitride

One of the main problems of electronics of MIS-devices - increasing stability of their features is considered. This problem solution is achieved by the surface-state density reduction using the rare-earth metal-alloyed silicon nitride films as a tunnel and barrier layer, and nanoclusters of SiGe sol...

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Main Authors: Kovalevsky, A. A., Strogova, A. S., Strogova, N. S., Babushkina, N. V.
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Language:eng ; rus
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Strogova, A. S.
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Babushkina, N. V.
description One of the main problems of electronics of MIS-devices - increasing stability of their features is considered. This problem solution is achieved by the surface-state density reduction using the rare-earth metal-alloyed silicon nitride films as a tunnel and barrier layer, and nanoclusters of SiGe solid solution and Ge as a storage medium. A CV-study is made of electrophysical parameters of MIS-structures of Me-Si 3 N 4 (rare-earth metals) - nanoclusters of Ge(SiGe)-Si 3 N 4 (rare-earth metals) -nSi, in which the rare-earth elements with different atomic radius are used as alloying components. The regularity of influence of the rare-earth metal radius values on electrophysical characteristics of MIS-structures is established.
doi_str_mv 10.1109/CRMICO.2014.6959641
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title Mis-structures with nanoscale dielectric films of the rare-earth metal-alloyed silicon nitride
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