XUV source based on the fast high-current capillary-discharge system

We have built two experimental devices (CAPEX and CAPEX-U) as XUV sources, which are based on a fast capillary discharge. On both these devices we have observed lasing at 46.9 nm (Ne-like Ar line). However, these devices do not only lase at 46.9 nm, but they are also used for testing a possibility o...

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Bibliographic Details
Main Authors: Schmidt, Jiri, Kolacek, Karel, Frolov, Oleksandr, Straus, Jaroslav
Format: Conference Proceeding
Language:English
Subjects:
capillary discharge
Current measurement
Discharges (electric)
Nitrogen
Plasmas
Sparks
Spontaneous emission
X-ray lasers
XUV laser
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Summary:We have built two experimental devices (CAPEX and CAPEX-U) as XUV sources, which are based on a fast capillary discharge. On both these devices we have observed lasing at 46.9 nm (Ne-like Ar line). However, these devices do not only lase at 46.9 nm, but they are also used for testing a possibility of amplification at the wavelengths below 20 nm, that have more practical applications. Our aim is to achieve lasing at 13.4 nm, using excited H-like N ions. The primary pumping process is a three-body collisional recombination one. Nowadays, the fast high-current capillary-discharge experiments with nitrogen-filled capillary are in progress. In this paper the recent results obtained from CAPEX discharge system will be presented (e.g. electrical and XUV characteristics of nitrogen plasma discharge.).
ISSN:1930-885X
2576-7283
DOI:10.1109/IPMHVC.2014.7287283