Influence of alloying elements on the phase formation of ultrathin Ni (<10nm) on Si(001) substrates

The influence of Ni thickness on the formation of Nickel suicides was systematically investigated between 0 and 15nm. Annealing thickness gradients distinguishes Alms that agglomerate (>5nm) and films that are morphologically stable (

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Bibliographic Details
Main Authors: Geenen, F. A., Van Stiphout, K., Jordan-Sweef, J., Vantomme, A., Lavoie, C., Detavernier, C.
Format: Conference Proceeding
Language:English
Subjects:
Alloying
Light sources
Physics
Silicides
Synchrotrons
Online Access:Request full text
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Description
Summary:The influence of Ni thickness on the formation of Nickel suicides was systematically investigated between 0 and 15nm. Annealing thickness gradients distinguishes Alms that agglomerate (>5nm) and films that are morphologically stable (
ISSN:2380-632X
2380-6338
DOI:10.1109/IITC-MAM.2015.7325615