Optimizing Wet Clean operations in an established manufacturing environment

Embedded contamination at the gate sector is considered a significant source of yield loss. By its nature, embedded contamination is not observed at the point of cause, making it more difficult to find its source. We discuss our efforts to find the point of cause through partitioning. Through a comb...

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Main Authors: Van Roijen, Raymond, Hilscher, David F., Meagher, Colleen, Rettmann, Ryan, McKindles, Derek
Format: Conference Proceeding
Language:English
Subjects:
Cleaning
Conferences
Contamination
Electronics
Frequency modulation
Hardware
Inspection
Logic gates
Monitoring
Optimization
Pins
Pollution sources
Semiconductor
Semiconductors
Wet processing
Yield
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creator Van Roijen, Raymond
Hilscher, David F.
Meagher, Colleen
Rettmann, Ryan
McKindles, Derek
description Embedded contamination at the gate sector is considered a significant source of yield loss. By its nature, embedded contamination is not observed at the point of cause, making it more difficult to find its source. We discuss our efforts to find the point of cause through partitioning. Through a combination of several improvements in Wet Clean steps we demonstrate significant reduction of the defect. We show how we leverage the toolset in an established Fab and discuss the implications of qualifying these changes in a mature environment.
doi_str_mv 10.1109/ASMC.2016.7491169
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subjects Cleaning
Conferences
Contamination
Electronics
Frequency modulation
Hardware
Inspection
Logic gates
Monitoring
Optimization
Pins
Pollution sources
Semiconductor
Semiconductors
Wet processing
Yield
title Optimizing Wet Clean operations in an established manufacturing environment
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