Layer thickness impact on Second Harmonic Generation characterization of SOI wafers

This paper presents Second Harmonic Generation (SHG) as a non-destructive characterization method for Silicon-On-Insulator (SOI) materials. For thick SOI stacks, the SHG signal is related to the thickness variations of the different layers. However in thin SOI films, the comparison between measureme...

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Bibliographic Details
Main Authors: Damianos, D., Ionica, I., Changala, J., Lei, M., Kaminski-Cachopo, A., Blanc-Pelissier, D., Cristoloveanu, S., Vitrant, G.
Format: Conference Proceeding
Language:English
Subjects:
Electric fields
multilayers
Nonlinear optics
nonlinear optics modeling
Optical films
Optical harmonic generation
Second Harmonic Generation
Semiconductor device modeling
Silicon
SOI
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Summary:This paper presents Second Harmonic Generation (SHG) as a non-destructive characterization method for Silicon-On-Insulator (SOI) materials. For thick SOI stacks, the SHG signal is related to the thickness variations of the different layers. However in thin SOI films, the comparison between measurements and optical modeling suggests a supplementary SHG contribution attributed to the electric fields at the SiO 2 /Si interfaces. As a result of this behavior the SHG technique can be used to evaluate interfacial electric fields and consequently interface charge density in SOI materials.
ISSN:2472-9132
DOI:10.1109/ULIS.2017.7962557