Measuring the wafer temperature in CVD tools using the wireless SensArray HighTemp-400 wafer

As technology nodes become smaller it is getting more important to control all aspects of influencing parameters on the deposition of thin films using a CVD process. It is well known that physical parameters like gas flow or temperature heavily influence the deposition rate and the quality/propertie...

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Bibliographic Details
Main Authors: Engelmann, J., Chu, D., Dupraz, T., Haupt, R., Hennesthal, C., Pflug, H., Jaschke, V., Stadel, M.
Format: Conference Proceeding
Language:English
Subjects:
Advanced Metrology
CVD-Tool
Matching
Metrology
Process control
SensArray
Temperature
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Summary:As technology nodes become smaller it is getting more important to control all aspects of influencing parameters on the deposition of thin films using a CVD process. It is well known that physical parameters like gas flow or temperature heavily influence the deposition rate and the quality/properties of the deposited thin films. To achieve good chamber to chamber matching of the deposition rate and high quality films it is crucial to control the physical parameters. In this paper we will present the wireless measurement of the temperature on the wafer surface up to 400°C under real temperature and process like conditions using the SensArray HighTemp-400 wafer. This approach paves the way for the control or the monitoring of the temperature on the wafer surface for the thin film deposition processes.
ISSN:2376-6697
DOI:10.1109/ASMC.2017.7969219