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Metrological Challenge for Scanning Microwave Microscopy
We have demonstrated a near-field scanning microwave microscopy (SMM) based on an atomic force microscopy (AFM) with interferometric circuits for characterization of high permittivity dielectric materials. Fixed impedance matching technique is generally used in commercial SMM product. We propose a p...
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creator | Hirano, Iku Kon, Seitaro Horibe, Masahiro |
description | We have demonstrated a near-field scanning microwave microscopy (SMM) based on an atomic force microscopy (AFM) with interferometric circuits for characterization of high permittivity dielectric materials. Fixed impedance matching technique is generally used in commercial SMM product. We propose a passive interferometer circuit is applied to SMM system in prototype or laboratory level system. All system is useful for operators without knowledge of microwave measurements, but they have somewhat limitation of measurement range in order to characterization of high dielectric permittivity materials. Then, we demonstrate high-precision characterization for high permittivity dielectric materials by our SMM system with passive interferometric detection circuit. |
doi_str_mv | 10.1109/CPEM.2018.8500989 |
format | conference_proceeding |
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Fixed impedance matching technique is generally used in commercial SMM product. We propose a passive interferometer circuit is applied to SMM system in prototype or laboratory level system. All system is useful for operators without knowledge of microwave measurements, but they have somewhat limitation of measurement range in order to characterization of high dielectric permittivity materials. Then, we demonstrate high-precision characterization for high permittivity dielectric materials by our SMM system with passive interferometric detection circuit.</description><identifier>EISSN: 2160-0171</identifier><identifier>EISBN: 1538609746</identifier><identifier>EISBN: 9781538609743</identifier><identifier>DOI: 10.1109/CPEM.2018.8500989</identifier><language>eng</language><publisher>IEEE</publisher><subject>high dielectric permittivity ; Indexes ; Interferometric circuit ; measurement techniques ; reflection measurement ; Scanning near-field microwave microscopy (SMM) ; Signal to noise ratio (SNR)</subject><ispartof>2018 Conference on Precision Electromagnetic Measurements (CPEM 2018), 2018, p.1-2</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/8500989$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,776,780,785,786,23909,23910,25118,27902,54530,54907</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/8500989$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Hirano, Iku</creatorcontrib><creatorcontrib>Kon, Seitaro</creatorcontrib><creatorcontrib>Horibe, Masahiro</creatorcontrib><title>Metrological Challenge for Scanning Microwave Microscopy</title><title>2018 Conference on Precision Electromagnetic Measurements (CPEM 2018)</title><addtitle>CPEM</addtitle><description>We have demonstrated a near-field scanning microwave microscopy (SMM) based on an atomic force microscopy (AFM) with interferometric circuits for characterization of high permittivity dielectric materials. Fixed impedance matching technique is generally used in commercial SMM product. We propose a passive interferometer circuit is applied to SMM system in prototype or laboratory level system. All system is useful for operators without knowledge of microwave measurements, but they have somewhat limitation of measurement range in order to characterization of high dielectric permittivity materials. Then, we demonstrate high-precision characterization for high permittivity dielectric materials by our SMM system with passive interferometric detection circuit.</description><subject>high dielectric permittivity</subject><subject>Indexes</subject><subject>Interferometric circuit</subject><subject>measurement techniques</subject><subject>reflection measurement</subject><subject>Scanning near-field microwave microscopy (SMM)</subject><subject>Signal to noise ratio (SNR)</subject><issn>2160-0171</issn><isbn>1538609746</isbn><isbn>9781538609743</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2018</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><recordid>eNotj01Lw0AQQFdBsNb-APGSP5A6s9nZnT1KqB_QoKCey7rOxpWYlKQo_fcK7em904On1BXCEhH8Tf28apYakJdMAJ79ibpAqtiCd8aeqplGCyWgw3O1mKYvANCWidDPFDeyG4duaHMMXVF_hq6TvpUiDWPxEkPf574tmhzH4Tf8yMGmOGz3l-oshW6SxZFz9Xa3eq0fyvXT_WN9uy4zOtqVOlHSGNhoISDrnDEVai8mhARsEUCAjVRR0juJ_h8wEMF-UDDOEnM1V9eHbhaRzXbM32Hcb46j1R8EMkWZ</recordid><startdate>201807</startdate><enddate>201807</enddate><creator>Hirano, Iku</creator><creator>Kon, Seitaro</creator><creator>Horibe, Masahiro</creator><general>IEEE</general><scope>6IE</scope><scope>6IH</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIO</scope></search><sort><creationdate>201807</creationdate><title>Metrological Challenge for Scanning Microwave Microscopy</title><author>Hirano, Iku ; Kon, Seitaro ; Horibe, Masahiro</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i175t-2f5f21a842e505677443129e4aaf086100e084e3cefb5e285040c06d5a4765883</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2018</creationdate><topic>high dielectric permittivity</topic><topic>Indexes</topic><topic>Interferometric circuit</topic><topic>measurement techniques</topic><topic>reflection measurement</topic><topic>Scanning near-field microwave microscopy (SMM)</topic><topic>Signal to noise ratio (SNR)</topic><toplevel>online_resources</toplevel><creatorcontrib>Hirano, Iku</creatorcontrib><creatorcontrib>Kon, Seitaro</creatorcontrib><creatorcontrib>Horibe, Masahiro</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE/IET Electronic Library (IEL)</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Hirano, Iku</au><au>Kon, Seitaro</au><au>Horibe, Masahiro</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Metrological Challenge for Scanning Microwave Microscopy</atitle><btitle>2018 Conference on Precision Electromagnetic Measurements (CPEM 2018)</btitle><stitle>CPEM</stitle><date>2018-07</date><risdate>2018</risdate><spage>1</spage><epage>2</epage><pages>1-2</pages><eissn>2160-0171</eissn><eisbn>1538609746</eisbn><eisbn>9781538609743</eisbn><abstract>We have demonstrated a near-field scanning microwave microscopy (SMM) based on an atomic force microscopy (AFM) with interferometric circuits for characterization of high permittivity dielectric materials. Fixed impedance matching technique is generally used in commercial SMM product. We propose a passive interferometer circuit is applied to SMM system in prototype or laboratory level system. All system is useful for operators without knowledge of microwave measurements, but they have somewhat limitation of measurement range in order to characterization of high dielectric permittivity materials. Then, we demonstrate high-precision characterization for high permittivity dielectric materials by our SMM system with passive interferometric detection circuit.</abstract><pub>IEEE</pub><doi>10.1109/CPEM.2018.8500989</doi><tpages>2</tpages></addata></record> |
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identifier | EISSN: 2160-0171 |
ispartof | 2018 Conference on Precision Electromagnetic Measurements (CPEM 2018), 2018, p.1-2 |
issn | 2160-0171 |
language | eng |
recordid | cdi_ieee_primary_8500989 |
source | IEEE Xplore All Conference Series |
subjects | high dielectric permittivity Indexes Interferometric circuit measurement techniques reflection measurement Scanning near-field microwave microscopy (SMM) Signal to noise ratio (SNR) |
title | Metrological Challenge for Scanning Microwave Microscopy |
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