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Metrological Challenge for Scanning Microwave Microscopy

We have demonstrated a near-field scanning microwave microscopy (SMM) based on an atomic force microscopy (AFM) with interferometric circuits for characterization of high permittivity dielectric materials. Fixed impedance matching technique is generally used in commercial SMM product. We propose a p...

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Main Authors: Hirano, Iku, Kon, Seitaro, Horibe, Masahiro
Format: Conference Proceeding
Language:English
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Kon, Seitaro
Horibe, Masahiro
description We have demonstrated a near-field scanning microwave microscopy (SMM) based on an atomic force microscopy (AFM) with interferometric circuits for characterization of high permittivity dielectric materials. Fixed impedance matching technique is generally used in commercial SMM product. We propose a passive interferometer circuit is applied to SMM system in prototype or laboratory level system. All system is useful for operators without knowledge of microwave measurements, but they have somewhat limitation of measurement range in order to characterization of high dielectric permittivity materials. Then, we demonstrate high-precision characterization for high permittivity dielectric materials by our SMM system with passive interferometric detection circuit.
doi_str_mv 10.1109/CPEM.2018.8500989
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ispartof 2018 Conference on Precision Electromagnetic Measurements (CPEM 2018), 2018, p.1-2
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source IEEE Xplore All Conference Series
subjects high dielectric permittivity
Indexes
Interferometric circuit
measurement techniques
reflection measurement
Scanning near-field microwave microscopy (SMM)
Signal to noise ratio (SNR)
title Metrological Challenge for Scanning Microwave Microscopy
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