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AC Device Variability in High- \kappa Metal-Gate CMOS Technology
The variability of CMOS device propagation delay is measured with a special test circuit. The circuit detects AC delay variations, as distinct from the DC effect of threshold voltage variation. The AC variability is likely due to the vertical resistance of the gate-stack. A comparison of two technol...
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Published in: | IEEE electron device letters 2019-01, Vol.40 (1), p.13-16 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites |
Online Access: | Get full text |
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Summary: | The variability of CMOS device propagation delay is measured with a special test circuit. The circuit detects AC delay variations, as distinct from the DC effect of threshold voltage variation. The AC variability is likely due to the vertical resistance of the gate-stack. A comparison of two technologies, using gate-first and gate-last gate-stacks, shows much reduced variability of the gate-last FETs. This is attributed to the absence of interfacial dopant fluctuation and the presence of tailored metallic interfaces in gate-last technologies. |
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ISSN: | 0741-3106 1558-0563 |
DOI: | 10.1109/LED.2018.2882268 |