Robust BEOL MIMCAP for Long and Controllable TDDB Lifetime

As operating frequency of the chips keeps increasing, high capacitance density MIMCap is needed to mitigate voltage droop for faster current injection. With high capacitance density, it is challenging to retain low leakage and long reliability lifetime. In this work, we will present an integrated MI...

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Bibliographic Details
Main Authors: Cheng, Lili, Choi, Seungman, Ogden, Sean, Tang, Teck Jung, Fox, Robert
Format: Conference Proceeding
Language:English
Subjects:
Acceleration
Aluminum oxide
BEOL
Capacitance
capacitor
Electrodes
high k
High-k dielectric materials
MIM
MIM capacitors
Reliability
TDDB
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Summary:As operating frequency of the chips keeps increasing, high capacitance density MIMCap is needed to mitigate voltage droop for faster current injection. With high capacitance density, it is challenging to retain low leakage and long reliability lifetime. In this work, we will present an integrated MIMCap with BEOL process which has robust TDDB. In addition, while retaining same high capacitance density and low leakage, this work will present a method to fabricate MIMCap with controlled TDDB lifetime, providing flexibility with voltage applied to either electrode.
ISSN:1938-1891
DOI:10.1109/IRPS.2019.8720407