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Test structure to assess the useful extent of regular dummy devices around high-precision metal fringe capacitor arrays

This paper discusses metal fringe capacitor matching test structures to characterize the impact of layer density disturbances at the edges of capacitor arrays. It is demonstrated that a seemingly minor pattern density disturbance can significantly affect the systematic mismatch in capacitor arrays u...

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Bibliographic Details
Main Authors: Tuinhout, Hans, Brunets, Ihor, Duijnhoven, Adrie Zegers-van
Format: Conference Proceeding
Language:English
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Summary:This paper discusses metal fringe capacitor matching test structures to characterize the impact of layer density disturbances at the edges of capacitor arrays. It is demonstrated that a seemingly minor pattern density disturbance can significantly affect the systematic mismatch in capacitor arrays up to well over 5 μm away from the array edges.
ISSN:1071-9032
2158-1029
DOI:10.1109/ICMTS.2019.8730988