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Differential Variable Base Charge Pumping ( \Delta-\text) for SiO2/SiC Interface Characterization

We propose an electrical evaluation technique named differential charge pumping (Δ-CP) to extract information on the interface states (D it ) at the SiC/SiO 2 interface. This technique allows to obtain information on (1) the physical location of the D it ; (2) the energetic spread of the D it in the...

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Main Authors: Moens, P., Constant, A., Stockman, A., Franchi, J., Allerstam, F.
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Language:English
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creator Moens, P.
Constant, A.
Stockman, A.
Franchi, J.
Allerstam, F.
description We propose an electrical evaluation technique named differential charge pumping (Δ-CP) to extract information on the interface states (D it ) at the SiC/SiO 2 interface. This technique allows to obtain information on (1) the physical location of the D it ; (2) the energetic spread of the D it in the bandgap; (3) if the D it are donor or acceptor type. First results indicate contributions from both the "S/D" region and the channel regions to the overall CP signal. Surprisingly a substantial contribution of the "S/D" regions of the transistors to the overall CP signal is observed. In the channel region, both donors and acceptor type states are identified, the majority being acceptor type.
doi_str_mv 10.1109/ISPSD.2019.8757560
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identifier ISBN: 1728105803
ispartof 2019 31st International Symposium on Power Semiconductor Devices and ICs (ISPSD), 2019, p.163-166
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source IEEE Xplore All Conference Series
subjects acceptor states
charge pumping
Charge pumps
Data mining
donor
Interface states
Logic gates
Photonic band gap
Predictive models
SiC
title Differential Variable Base Charge Pumping ( \Delta-\text) for SiO2/SiC Interface Characterization
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