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Differential Variable Base Charge Pumping ( \Delta-\text) for SiO2/SiC Interface Characterization
We propose an electrical evaluation technique named differential charge pumping (Δ-CP) to extract information on the interface states (D it ) at the SiC/SiO 2 interface. This technique allows to obtain information on (1) the physical location of the D it ; (2) the energetic spread of the D it in the...
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creator | Moens, P. Constant, A. Stockman, A. Franchi, J. Allerstam, F. |
description | We propose an electrical evaluation technique named differential charge pumping (Δ-CP) to extract information on the interface states (D it ) at the SiC/SiO 2 interface. This technique allows to obtain information on (1) the physical location of the D it ; (2) the energetic spread of the D it in the bandgap; (3) if the D it are donor or acceptor type. First results indicate contributions from both the "S/D" region and the channel regions to the overall CP signal. Surprisingly a substantial contribution of the "S/D" regions of the transistors to the overall CP signal is observed. In the channel region, both donors and acceptor type states are identified, the majority being acceptor type. |
doi_str_mv | 10.1109/ISPSD.2019.8757560 |
format | conference_proceeding |
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In the channel region, both donors and acceptor type states are identified, the majority being acceptor type.</description><identifier>ISBN: 1728105803</identifier><identifier>ISBN: 9781728105802</identifier><identifier>EISSN: 1946-0201</identifier><identifier>EISBN: 9781728105819</identifier><identifier>EISBN: 1728105811</identifier><identifier>DOI: 10.1109/ISPSD.2019.8757560</identifier><language>eng</language><publisher>IEEE</publisher><subject>acceptor states ; charge pumping ; Charge pumps ; Data mining ; donor ; Interface states ; Logic gates ; Photonic band gap ; Predictive models ; SiC</subject><ispartof>2019 31st International Symposium on Power Semiconductor Devices and ICs (ISPSD), 2019, p.163-166</ispartof><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/8757560$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>309,310,780,784,789,790,27925,54555,54932</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/8757560$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc></links><search><creatorcontrib>Moens, P.</creatorcontrib><creatorcontrib>Constant, A.</creatorcontrib><creatorcontrib>Stockman, A.</creatorcontrib><creatorcontrib>Franchi, J.</creatorcontrib><creatorcontrib>Allerstam, F.</creatorcontrib><title>Differential Variable Base Charge Pumping ( \Delta-\text) for SiO2/SiC Interface Characterization</title><title>2019 31st International Symposium on Power Semiconductor Devices and ICs (ISPSD)</title><addtitle>ISPSD</addtitle><description>We propose an electrical evaluation technique named differential charge pumping (Δ-CP) to extract information on the interface states (D it ) at the SiC/SiO 2 interface. This technique allows to obtain information on (1) the physical location of the D it ; (2) the energetic spread of the D it in the bandgap; (3) if the D it are donor or acceptor type. First results indicate contributions from both the "S/D" region and the channel regions to the overall CP signal. Surprisingly a substantial contribution of the "S/D" regions of the transistors to the overall CP signal is observed. In the channel region, both donors and acceptor type states are identified, the majority being acceptor type.</description><subject>acceptor states</subject><subject>charge pumping</subject><subject>Charge pumps</subject><subject>Data mining</subject><subject>donor</subject><subject>Interface states</subject><subject>Logic gates</subject><subject>Photonic band gap</subject><subject>Predictive models</subject><subject>SiC</subject><issn>1946-0201</issn><isbn>1728105803</isbn><isbn>9781728105802</isbn><isbn>9781728105819</isbn><isbn>1728105811</isbn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2019</creationdate><recordtype>conference_proceeding</recordtype><sourceid>6IE</sourceid><recordid>eNo1UEtLw0AYXBXBtvYP6GWPeki7376ye9TUR6HQQtRToWySL3UlTctmheqvt9B6GoZ5wAwhN8BGAMyOp_kin4w4AzsyqUqVZmdkaFMDKTfAlAF7TnpgpU7YwXRB-v8CE1ek33VfjCkBCnrETXxdY8A2etfQDxe8Kxqkj65Dmn26sEa6-N7sfLumd3Q5wSa6ZBlxH-9pvQ0093M-zn1Gp23EULvymHLlgflfF_22vSaXtWs6HJ5wQN6fn96y12Q2f5lmD7PEQ6piIlNZFVWNUJmSaQlVaVmtpeVgCmMML9AcNoiyUMCF1RVoobkUFqVQhTZODMjtsdcj4moX_MaFn9XpHvEHiP1VtQ</recordid><startdate>201905</startdate><enddate>201905</enddate><creator>Moens, P.</creator><creator>Constant, A.</creator><creator>Stockman, A.</creator><creator>Franchi, J.</creator><creator>Allerstam, F.</creator><general>IEEE</general><scope>6IE</scope><scope>6IH</scope><scope>CBEJK</scope><scope>RIE</scope><scope>RIO</scope></search><sort><creationdate>201905</creationdate><title>Differential Variable Base Charge Pumping ( \Delta-\text) for SiO2/SiC Interface Characterization</title><author>Moens, P. ; Constant, A. ; Stockman, A. ; Franchi, J. ; Allerstam, F.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i175t-474dbdfe1d8c0641dc90f649218b8882be87283cb512396d16362439e435b68a3</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2019</creationdate><topic>acceptor states</topic><topic>charge pumping</topic><topic>Charge pumps</topic><topic>Data mining</topic><topic>donor</topic><topic>Interface states</topic><topic>Logic gates</topic><topic>Photonic band gap</topic><topic>Predictive models</topic><topic>SiC</topic><toplevel>online_resources</toplevel><creatorcontrib>Moens, P.</creatorcontrib><creatorcontrib>Constant, A.</creatorcontrib><creatorcontrib>Stockman, A.</creatorcontrib><creatorcontrib>Franchi, J.</creatorcontrib><creatorcontrib>Allerstam, F.</creatorcontrib><collection>IEEE Electronic Library (IEL) Conference Proceedings</collection><collection>IEEE Proceedings Order Plan (POP) 1998-present by volume</collection><collection>IEEE Xplore All Conference Proceedings</collection><collection>IEEE Electronic Library Online</collection><collection>IEEE Proceedings Order Plans (POP) 1998-present</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Moens, P.</au><au>Constant, A.</au><au>Stockman, A.</au><au>Franchi, J.</au><au>Allerstam, F.</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Differential Variable Base Charge Pumping ( \Delta-\text) for SiO2/SiC Interface Characterization</atitle><btitle>2019 31st International Symposium on Power Semiconductor Devices and ICs (ISPSD)</btitle><stitle>ISPSD</stitle><date>2019-05</date><risdate>2019</risdate><spage>163</spage><epage>166</epage><pages>163-166</pages><eissn>1946-0201</eissn><isbn>1728105803</isbn><isbn>9781728105802</isbn><eisbn>9781728105819</eisbn><eisbn>1728105811</eisbn><abstract>We propose an electrical evaluation technique named differential charge pumping (Δ-CP) to extract information on the interface states (D it ) at the SiC/SiO 2 interface. This technique allows to obtain information on (1) the physical location of the D it ; (2) the energetic spread of the D it in the bandgap; (3) if the D it are donor or acceptor type. First results indicate contributions from both the "S/D" region and the channel regions to the overall CP signal. Surprisingly a substantial contribution of the "S/D" regions of the transistors to the overall CP signal is observed. In the channel region, both donors and acceptor type states are identified, the majority being acceptor type.</abstract><pub>IEEE</pub><doi>10.1109/ISPSD.2019.8757560</doi><tpages>4</tpages></addata></record> |
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identifier | ISBN: 1728105803 |
ispartof | 2019 31st International Symposium on Power Semiconductor Devices and ICs (ISPSD), 2019, p.163-166 |
issn | 1946-0201 |
language | eng |
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source | IEEE Xplore All Conference Series |
subjects | acceptor states charge pumping Charge pumps Data mining donor Interface states Logic gates Photonic band gap Predictive models SiC |
title | Differential Variable Base Charge Pumping ( \Delta-\text) for SiO2/SiC Interface Characterization |
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