Impact of Sacrificial Hard Mask Material in BEOL Integration in Advanced Technology

As technology scaling continues, the selection of materials for sacrificial hard masks become very critical. Sacrificial hard masks are thin films that are used for patterning or protecting critical underlying films from damage during various processes like etching, deposition or planarization. In t...

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Main Authors: Ramanathan, Eswar, Johanson, Henrik, Damjanovic, Daniel, Sun, ZhiGuo, Sircar, Anirvan, Eah, Sang-Kee, Bombardier, Colin, DaSilva, Adam, O'Brien, Brendan, Roux, Alycia, Cucci, Brett, Jiang, Lei, Christopher, Ordonio, Montgomery, Christa, Venkatasubramanian, Vandana, Rana, Vijaya, Mody, Jay, Shepard, Joseph, Child, Craig, Morganfeld, Bradley, Sheraw, Rebekah, Takmeel, Qanit, MaryClaire, Silvestre, Mahalingam, AnbuSelvam K.M., Ghosh, Somnath, Donegan, Keith, Chandrasekar, Ashwini, Singh, Sunil
Format: Conference Proceeding
Language:English
Subjects:
Adhesives
Dielectrics
Hard mask
Metallization
Sacrificial layer
Self-aligned via
Tin
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Summary:As technology scaling continues, the selection of materials for sacrificial hard masks become very critical. Sacrificial hard masks are thin films that are used for patterning or protecting critical underlying films from damage during various processes like etching, deposition or planarization. In this article, we discuss the effect of the sacrificial hard mask material on the erosion in the self-aligned via (SAV) patterning process, selectivity in the etch process, adhesion, defectivity, and metallization.
ISSN:2376-6697
DOI:10.1109/ASMC.2019.8791788