Sputtering and Electron Beam Irradiation of WS2/MoS2 and MoS2/WS2 Heterostructures for Enhanced Photoresponsivity

In the present study, we proposed heterostructures of MoS 2 and WS 2 formed by radio frequency (RF) magnetron sputtering and electron beam irradiation (EBI) for obtaining enhanced photoresponsivity. Each amorphous transition metal dichalcogenide (TMD) was sequentially deposited and EBI was performed...

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Bibliographic Details
Published in:IEEE transactions on nanotechnology 2019, Vol.18, p.1200-1203
Main Authors: Kim, Bong Ho, Kwon, Soon Hyeong, Yoon, Hongji, Kim, Dong Wook, Yoon, Young Joon
Format: Article
Language:English
Subjects:
2D material
electron beam irradiation (EBI)
Electron beams
Electron irradiation
Electrons
Heterojunctions
heterostructure
Heterostructures
Magnetron sputtering
Molybdenum
Molybdenum disulfide
MoS<inline-formula xmlns:ali="http://www.niso.org/schemas/ali/1.0/" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance"> <tex-math notation="LaTeX"> _{2}</tex-math> </inline-formula>
photodetector
Photoelectrons
Photonic band gap
Radio frequency
Sputtering
Sulfur
Transition metal compounds
transition metal dichalcogenide (TMD)
Tungsten disulfide
Two dimensional displays
WS<inline-formula xmlns:ali="http://www.niso.org/schemas/ali/1.0/" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance"> <tex-math notation="LaTeX"> _{2}</tex-math> </inline-formula>
X ray photoelectron spectroscopy
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Summary:In the present study, we proposed heterostructures of MoS 2 and WS 2 formed by radio frequency (RF) magnetron sputtering and electron beam irradiation (EBI) for obtaining enhanced photoresponsivity. Each amorphous transition metal dichalcogenide (TMD) was sequentially deposited and EBI was performed on the as-deposited TMD heterostructures. After EBI, the atomic rearrangement of the heterostructures was studied. Moreover, the depth profile of the synthesized heterostructures was investigated using angle-resolved X-ray photoelectron spectroscopy (AR-XPS). We achieved a photoresponsivity of 5.1 A/W in EBI-treated TMD heterostructures, which was further enhanced by three orders as compared with that obtained in EBI-treated TMD single structures.
ISSN:1536-125X
1941-0085
DOI:10.1109/TNANO.2019.2951599