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Technological Sensor on Coupled Radial Spirals
We present the sensor with a sensitive element (SE) based on coupled radial spirals, which can be used for monitoring technological processes in the Electronic Industry, as well as for detecting damages on the pipelines under protective coatings. The main properties and characteristics of such SE ar...
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Published in: | IEEE transactions on electron devices 2020-03, Vol.67 (3), p.1165-1170 |
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container_title | IEEE transactions on electron devices |
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creator | Pchelnikov, Yuriy N. Yelizarov, Andrey A. |
description | We present the sensor with a sensitive element (SE) based on coupled radial spirals, which can be used for monitoring technological processes in the Electronic Industry, as well as for detecting damages on the pipelines under protective coatings. The main properties and characteristics of such SE are analyzed and measured. It is shown that the concentration of the electromagnetic field in a measuring space, caused by slowing down of the the wave, and splitting of the electric and magnetic fields leads to a significant increase in sensitivity, whereas the multiple increases in the slowdown makes it possible to use the advantages of SE with distributed parameters at relatively low operating frequencies. The practical realization of the described sensor is demonstrated in measuring the ion implantation processes and the thickness of the metallization, as well as in monitoring the invisible cracks and damages through the protective coats on the metal surfaces. |
doi_str_mv | 10.1109/TED.2020.2965448 |
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The main properties and characteristics of such SE are analyzed and measured. It is shown that the concentration of the electromagnetic field in a measuring space, caused by slowing down of the the wave, and splitting of the electric and magnetic fields leads to a significant increase in sensitivity, whereas the multiple increases in the slowdown makes it possible to use the advantages of SE with distributed parameters at relatively low operating frequencies. The practical realization of the described sensor is demonstrated in measuring the ion implantation processes and the thickness of the metallization, as well as in monitoring the invisible cracks and damages through the protective coats on the metal surfaces.</description><identifier>ISSN: 0018-9383</identifier><identifier>EISSN: 1557-9646</identifier><identifier>DOI: 10.1109/TED.2020.2965448</identifier><identifier>CODEN: IETDAI</identifier><language>eng</language><publisher>New York: IEEE</publisher><subject>Cracks ; Damage detection ; Electrodynamics ; Electromagnetic fields ; Ion implantation ; Metal surfaces ; Metallizing ; Monitoring ; pierce oscillator ; Protective coatings ; radial spirals ; RF and microwave measurements ; sensitive element (SE) ; Sensors ; slow-wave structure (SWS) ; slowdown ; Spirals</subject><ispartof>IEEE transactions on electron devices, 2020-03, Vol.67 (3), p.1165-1170</ispartof><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. 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The main properties and characteristics of such SE are analyzed and measured. It is shown that the concentration of the electromagnetic field in a measuring space, caused by slowing down of the the wave, and splitting of the electric and magnetic fields leads to a significant increase in sensitivity, whereas the multiple increases in the slowdown makes it possible to use the advantages of SE with distributed parameters at relatively low operating frequencies. The practical realization of the described sensor is demonstrated in measuring the ion implantation processes and the thickness of the metallization, as well as in monitoring the invisible cracks and damages through the protective coats on the metal surfaces.</description><subject>Cracks</subject><subject>Damage detection</subject><subject>Electrodynamics</subject><subject>Electromagnetic fields</subject><subject>Ion implantation</subject><subject>Metal surfaces</subject><subject>Metallizing</subject><subject>Monitoring</subject><subject>pierce oscillator</subject><subject>Protective coatings</subject><subject>radial spirals</subject><subject>RF and microwave measurements</subject><subject>sensitive element (SE)</subject><subject>Sensors</subject><subject>slow-wave structure (SWS)</subject><subject>slowdown</subject><subject>Spirals</subject><issn>0018-9383</issn><issn>1557-9646</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><recordid>eNo9kM1Lw0AQxRdRsFbvgpeA58Sd_Z6j1FaFgqD1vKzJRlNiNu62B_97t6R4ejPMe_PgR8g10AqA4t1m-VAxymjFUEkhzAmZgZS6RCXUKZlRCqZEbvg5uUhpm1clBJuRauPrryH04bOrXV-8-SGFWIShWIT92PumeHVNdziMXXR9uiRnbRZ_ddQ5eV8tN4uncv3y-Ly4X5c1Q9iVximOqMA7zlQNVCPKPHOjTeu8bhUwxx2IBnjz4SjSRtetbjVKqZBJyefkdvo7xvCz92lnt2Efh1xpGVcGDBOos4tOrjqGlKJv7Ri7bxd_LVB7oGIzFXugYo9UcuRminTe-3-7QW00cP4H_1FbZw</recordid><startdate>20200301</startdate><enddate>20200301</enddate><creator>Pchelnikov, Yuriy N.</creator><creator>Yelizarov, Andrey A.</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope><orcidid>https://orcid.org/0000-0003-1786-2291</orcidid></search><sort><creationdate>20200301</creationdate><title>Technological Sensor on Coupled Radial Spirals</title><author>Pchelnikov, Yuriy N. ; Yelizarov, Andrey A.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c291t-8a639961ea326c107995ea33878fae7f612a3a14d13dba090d7cf7f7955692553</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2020</creationdate><topic>Cracks</topic><topic>Damage detection</topic><topic>Electrodynamics</topic><topic>Electromagnetic fields</topic><topic>Ion implantation</topic><topic>Metal surfaces</topic><topic>Metallizing</topic><topic>Monitoring</topic><topic>pierce oscillator</topic><topic>Protective coatings</topic><topic>radial spirals</topic><topic>RF and microwave measurements</topic><topic>sensitive element (SE)</topic><topic>Sensors</topic><topic>slow-wave structure (SWS)</topic><topic>slowdown</topic><topic>Spirals</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Pchelnikov, Yuriy N.</creatorcontrib><creatorcontrib>Yelizarov, Andrey A.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEL</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>IEEE transactions on electron devices</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Pchelnikov, Yuriy N.</au><au>Yelizarov, Andrey A.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Technological Sensor on Coupled Radial Spirals</atitle><jtitle>IEEE transactions on electron devices</jtitle><stitle>TED</stitle><date>2020-03-01</date><risdate>2020</risdate><volume>67</volume><issue>3</issue><spage>1165</spage><epage>1170</epage><pages>1165-1170</pages><issn>0018-9383</issn><eissn>1557-9646</eissn><coden>IETDAI</coden><abstract>We present the sensor with a sensitive element (SE) based on coupled radial spirals, which can be used for monitoring technological processes in the Electronic Industry, as well as for detecting damages on the pipelines under protective coatings. The main properties and characteristics of such SE are analyzed and measured. It is shown that the concentration of the electromagnetic field in a measuring space, caused by slowing down of the the wave, and splitting of the electric and magnetic fields leads to a significant increase in sensitivity, whereas the multiple increases in the slowdown makes it possible to use the advantages of SE with distributed parameters at relatively low operating frequencies. The practical realization of the described sensor is demonstrated in measuring the ion implantation processes and the thickness of the metallization, as well as in monitoring the invisible cracks and damages through the protective coats on the metal surfaces.</abstract><cop>New York</cop><pub>IEEE</pub><doi>10.1109/TED.2020.2965448</doi><tpages>6</tpages><orcidid>https://orcid.org/0000-0003-1786-2291</orcidid></addata></record> |
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subjects | Cracks Damage detection Electrodynamics Electromagnetic fields Ion implantation Metal surfaces Metallizing Monitoring pierce oscillator Protective coatings radial spirals RF and microwave measurements sensitive element (SE) Sensors slow-wave structure (SWS) slowdown Spirals |
title | Technological Sensor on Coupled Radial Spirals |
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