Modeling and measurement of monomer pressure evolution in an inductively coupled pulsed plasma reactor for thin polymer films

A model has been developed to predict the evolution of monomer pressure over time in an inductively coupled plasma reactor. The model uses an analogous electrical circuit to predict preplasma gas flow conditions. Based on the monomer pressure model, a relationship between pressure prior to electrica...

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Bibliographic Details
Published in:IEEE transactions on plasma science 2000-12, Vol.28 (6), p.2172-2178
Main Authors: Shepsis, L.V., Pedrow, P.D., Mahalingam, R., Osman, M.A.
Format: Article
Language:English
Subjects:
Chemical engineering
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Inductors
Materials science
Measurement
Methods of deposition of films and coatings
film growth and epitaxy
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma
Plasma applications
Plasma measurements
Plasma properties
Polymer films
Polymers
Powders
Predictive models
Pressure measurement
Pulse measurements
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Description
Summary:A model has been developed to predict the evolution of monomer pressure over time in an inductively coupled plasma reactor. The model uses an analogous electrical circuit to predict preplasma gas flow conditions. Based on the monomer pressure model, a relationship between pressure prior to electrical discharge and the corresponding plasma polymerized acetylene deposition rate was measured experimentally. A plot of measured deposition rate versus preplasma monomer pressure was observed to have a relative maximum.
ISSN:0093-3813
1939-9375
DOI:10.1109/27.902244