Random telegraph signal amplitudes in sub 100 nm (decanano) MOSFETs: a 3D 'Atomistic' simulation study

In this paper we use 3D simulations to study the amplitudes of random telegraph signals (RTS) associated with the trapping of a single carrier in interface states in the channel of sub 100 nm (decanano) MOSFETs. Both simulations using continuous doping charge and random discrete dopants in the activ...

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Bibliographic Details
Main Authors: Asenov, A., Balasubramaniam, R., Brown, A.R., Davies, J.H., Saini, S.
Format: Conference Proceeding
Language:English
Subjects:
Charge carrier density
Circuits
Doping
Electron traps
Fluctuations
Interface states
MOSFETs
NASA
Telegraphy
Temperature
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Summary:In this paper we use 3D simulations to study the amplitudes of random telegraph signals (RTS) associated with the trapping of a single carrier in interface states in the channel of sub 100 nm (decanano) MOSFETs. Both simulations using continuous doping charge and random discrete dopants in the active region of the MOSFETs are presented. We have studied the dependence of the RTS amplitudes on the position of the trapped charge in the channel and on the device design parameters. We have observed a significant increase in the maximum RTS amplitude when discrete random dopants are employed in the simulations.
DOI:10.1109/IEDM.2000.904311