Qualifying Inline Xe Plasma FIB - Returning Milled Wafers Back to Production

This paper describes a plan of tests and several results of experiments that were performed to determine whether wafers that were milled using an inline xenon (Xe) plasma focused ion beam (PFIB) could continue processing through the standard production flow without being scrapped for contamination,...

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Bibliographic Details
Main Authors: Niedermeier, Franz, Kammerer, Rolf, Kipferl, Wolfgang, Henneck, Stephan, Pearl, Haim
Format: Conference Proceeding
Language:English
Subjects:
Contamination
Gallium
Milling
Phase change materials
Reliability
Surface treatment
Xenon
Online Access:Request full text
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Description
Summary:This paper describes a plan of tests and several results of experiments that were performed to determine whether wafers that were milled using an inline xenon (Xe) plasma focused ion beam (PFIB) could continue processing through the standard production flow without being scrapped for contamination, yield, or reliability issues.
ISSN:2376-6697
DOI:10.1109/ASMC49169.2020.9185315