Growth of large area YBa/sub 2/Cu/sub 3/O/sub 7-x/ thin film by cylindrical hollow cathode sputtering

We have deposited large area YBa/sub 2/Cu/sub 3/O/sub 7-x/ thin films by cylindrical hollow cathode sputtering using a 9 cm diameter hollow cathode sputtering gun. The zero resistance temperature of the films at the center and edge were in the range from 86 K to 83 K. X-ray diffraction analysis and...

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Bibliographic Details
Published in:IEEE transactions on applied superconductivity 2001-03, Vol.11 (1), p.3844-3847
Main Authors: Jeong-Dae Suh, Seok Kil Han, Kwang Yong Kang, Min Hwan Kwak
Format: Article
Language:English
Subjects:
Cathodes
Electrons
Geometry
Magnetic flux
Sputtering
Substrates
Surface discharges
Telephony
Temperature
Yttrium barium copper oxide
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Summary:We have deposited large area YBa/sub 2/Cu/sub 3/O/sub 7-x/ thin films by cylindrical hollow cathode sputtering using a 9 cm diameter hollow cathode sputtering gun. The zero resistance temperature of the films at the center and edge were in the range from 86 K to 83 K. X-ray diffraction analysis and scanning electron micrographs showed that the films are completely c-axis oriented. The variation of the thickness was less than 5% over the whole substrate. The values of microwave surface resistance were 1 m/spl Omega/ at 25 K and 40 m/spl Omega/ at 77 K and 19.6 GHz.
ISSN:1051-8223
1558-2515
DOI:10.1109/77.919903