Metastable argon conditions and balance composition of argon-silane rf plasma

Silane in argon plasma kinetics with next decay products delivering to the substrate through nozzle is presented. In active discharge zone the kinetics of plasma-chemical reactions are closely connected with the kinetics of free electrons. Numerical modeling of the physics and chemical processes was...

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Main Authors: Hudaybergenov, G.J., Strunin, V.I., Lyahov, A.A., Shkourkin, V.V.
Format: Conference Proceeding
Language:English
Subjects:
Argon
Chemical processes
Electrons
Geometry
Kinetic theory
Metastasis
Numerical models
Physics
Plasma chemistry
Solid modeling
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Strunin, V.I.
Lyahov, A.A.
Shkourkin, V.V.
description Silane in argon plasma kinetics with next decay products delivering to the substrate through nozzle is presented. In active discharge zone the kinetics of plasma-chemical reactions are closely connected with the kinetics of free electrons. Numerical modeling of the physics and chemical processes was made for cylindrical geometry. Numerical modeling results of calculations of the rate constants of electronic reactions and from the equations of chemical kinetics according to defined values of rate constants of some plasma chemical process, the values of equipoise concentrations depending on period of mixture residence in discharge zone were obtained.
doi_str_mv 10.1109/SREDM.2001.939160
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ispartof 2001 Siberian Russian Student Workshop on Electron Devices and Materials. Proceedings 2nd Annual (IEEE Cat. No.01EX469), 2001, p.85-86
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source IEEE Electronic Library (IEL) Conference Proceedings
subjects Argon
Chemical processes
Electrons
Geometry
Kinetic theory
Metastasis
Numerical models
Physics
Plasma chemistry
Solid modeling
title Metastable argon conditions and balance composition of argon-silane rf plasma
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