Loading…

Light Assisted Electro-Metallization in Resistive Switch With Optical Accessibility

An optically assisted electrically writable non-volatile nanophotonic resistive switch based on silicon is proposed with an optical readout capability. The proposed scheme also address the issue of undesired current overshoot in resistive switches. Optical assistance is provided with the blue pump l...

Full description

Saved in:
Bibliographic Details
Published in:Journal of lightwave technology 2021-09, Vol.39 (18), p.5869-5874
Main Authors: Singh, Lalit, Sulabh, Kaushik, Vishal, Rajput, Swati, Mishra, Rahul Dev, Kumar, Mukesh
Format: Article
Language:English
Subjects:
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
cited_by cdi_FETCH-LOGICAL-c291t-dcd3a345b587ce7cd945d15c31dab375626f00d8cf4178f4b4d3e4a098f1d9aa3
cites cdi_FETCH-LOGICAL-c291t-dcd3a345b587ce7cd945d15c31dab375626f00d8cf4178f4b4d3e4a098f1d9aa3
container_end_page 5874
container_issue 18
container_start_page 5869
container_title Journal of lightwave technology
container_volume 39
creator Singh, Lalit
Sulabh
Kaushik, Vishal
Rajput, Swati
Mishra, Rahul Dev
Kumar, Mukesh
description An optically assisted electrically writable non-volatile nanophotonic resistive switch based on silicon is proposed with an optical readout capability. The proposed scheme also address the issue of undesired current overshoot in resistive switches. Optical assistance is provided with the blue pump light which leads to the photogenrated charge carriers in the active TiO_{2} layer to lower the set voltage and to improve the endurance of the device. A large hysteresis of the current loop in presence of a blue wavelength of light at lower voltages is observed with the proposed three-layered device of Ag/TiO_{2}/p-Si. The electrical resistive state of the device is readout at 1550-nm of wavelength with an optical extinction ratio of 16 dB for 1 mm long device. The optical guidance with the formation (low resistance state) and dissolution (high resistance state) of conductive path filament in the active layer of TiO_{2} is also discussed. The proposed nanophotonic functionality can be useful in realizing ultra-compact on-chip devices for optical switching, modulation and neuromorphic computing.
doi_str_mv 10.1109/JLT.2021.3091970
format article
fullrecord <record><control><sourceid>proquest_ieee_</sourceid><recordid>TN_cdi_ieee_primary_9464682</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>9464682</ieee_id><sourcerecordid>2575130255</sourcerecordid><originalsourceid>FETCH-LOGICAL-c291t-dcd3a345b587ce7cd945d15c31dab375626f00d8cf4178f4b4d3e4a098f1d9aa3</originalsourceid><addsrcrecordid>eNo9kEtLAzEAhIMoWKt3wUvA89Y8N8mxlPpipWArHkM2ydqUtVuTVKm_3i0tnubyzQx8AFxjNMIYqbvnajEiiOARRQorgU7AAHMuC0IwPQUDJCgtpCDsHFyktEIIMybFAMyr8LHMcJxSSNk7OG29zbErXnw2bRt-TQ7dGoY1fPV7Inx7OP8J2S7he8hLONvkYE0Lx9b6fqIObci7S3DWmDb5q2MOwdv9dDF5LKrZw9NkXBWWKJwLZx01lPGaS2G9sE4x7jC3FDtTU8FLUjYIOWkbhoVsWM0c9cwgJRvslDF0CG4Pu5vYfW19ynrVbeO6v9SEC44pIpz3FDpQNnYpRd_oTQyfJu40RnqvTvfq9F6dPqrrKzeHSvDe_-OKlayUhP4BZYhq0w</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2575130255</pqid></control><display><type>article</type><title>Light Assisted Electro-Metallization in Resistive Switch With Optical Accessibility</title><source>IEEE Xplore (Online service)</source><creator>Singh, Lalit ; Sulabh ; Kaushik, Vishal ; Rajput, Swati ; Mishra, Rahul Dev ; Kumar, Mukesh</creator><creatorcontrib>Singh, Lalit ; Sulabh ; Kaushik, Vishal ; Rajput, Swati ; Mishra, Rahul Dev ; Kumar, Mukesh</creatorcontrib><description><![CDATA[An optically assisted electrically writable non-volatile nanophotonic resistive switch based on silicon is proposed with an optical readout capability. The proposed scheme also address the issue of undesired current overshoot in resistive switches. Optical assistance is provided with the blue pump light which leads to the photogenrated charge carriers in the active <inline-formula><tex-math notation="LaTeX">TiO_{2}</tex-math></inline-formula> layer to lower the set voltage and to improve the endurance of the device. A large hysteresis of the current loop in presence of a blue wavelength of light at lower voltages is observed with the proposed three-layered device of Ag/<inline-formula><tex-math notation="LaTeX">TiO_{2}</tex-math></inline-formula>/p-Si. The electrical resistive state of the device is readout at 1550-nm of wavelength with an optical extinction ratio of 16 dB for 1 mm long device. The optical guidance with the formation (low resistance state) and dissolution (high resistance state) of conductive path filament in the active layer of <inline-formula><tex-math notation="LaTeX">TiO_{2}</tex-math></inline-formula> is also discussed. The proposed nanophotonic functionality can be useful in realizing ultra-compact on-chip devices for optical switching, modulation and neuromorphic computing.]]></description><identifier>ISSN: 0733-8724</identifier><identifier>EISSN: 1558-2213</identifier><identifier>DOI: 10.1109/JLT.2021.3091970</identifier><identifier>CODEN: JLTEDG</identifier><language>eng</language><publisher>New York: IEEE</publisher><subject>Current carriers ; Electrodes ; High resistance ; integrated photonics ; Ions ; Low resistance ; Metallizing ; Metals ; Nanophotonic resistive switch ; Optical devices ; Optical imaging ; Optical pumping ; Optical switches ; Optical switching ; plasmonic waveguide ; Silicon ; Switches</subject><ispartof>Journal of lightwave technology, 2021-09, Vol.39 (18), p.5869-5874</ispartof><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2021</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c291t-dcd3a345b587ce7cd945d15c31dab375626f00d8cf4178f4b4d3e4a098f1d9aa3</citedby><cites>FETCH-LOGICAL-c291t-dcd3a345b587ce7cd945d15c31dab375626f00d8cf4178f4b4d3e4a098f1d9aa3</cites><orcidid>0000-0002-6537-1246 ; 0000-0001-6197-5977 ; 0000-0002-3212-8485 ; 0000-0003-3708-2014 ; 0000-0001-8406-4535</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/9464682$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,780,784,27924,27925,54796</link.rule.ids></links><search><creatorcontrib>Singh, Lalit</creatorcontrib><creatorcontrib>Sulabh</creatorcontrib><creatorcontrib>Kaushik, Vishal</creatorcontrib><creatorcontrib>Rajput, Swati</creatorcontrib><creatorcontrib>Mishra, Rahul Dev</creatorcontrib><creatorcontrib>Kumar, Mukesh</creatorcontrib><title>Light Assisted Electro-Metallization in Resistive Switch With Optical Accessibility</title><title>Journal of lightwave technology</title><addtitle>JLT</addtitle><description><![CDATA[An optically assisted electrically writable non-volatile nanophotonic resistive switch based on silicon is proposed with an optical readout capability. The proposed scheme also address the issue of undesired current overshoot in resistive switches. Optical assistance is provided with the blue pump light which leads to the photogenrated charge carriers in the active <inline-formula><tex-math notation="LaTeX">TiO_{2}</tex-math></inline-formula> layer to lower the set voltage and to improve the endurance of the device. A large hysteresis of the current loop in presence of a blue wavelength of light at lower voltages is observed with the proposed three-layered device of Ag/<inline-formula><tex-math notation="LaTeX">TiO_{2}</tex-math></inline-formula>/p-Si. The electrical resistive state of the device is readout at 1550-nm of wavelength with an optical extinction ratio of 16 dB for 1 mm long device. The optical guidance with the formation (low resistance state) and dissolution (high resistance state) of conductive path filament in the active layer of <inline-formula><tex-math notation="LaTeX">TiO_{2}</tex-math></inline-formula> is also discussed. The proposed nanophotonic functionality can be useful in realizing ultra-compact on-chip devices for optical switching, modulation and neuromorphic computing.]]></description><subject>Current carriers</subject><subject>Electrodes</subject><subject>High resistance</subject><subject>integrated photonics</subject><subject>Ions</subject><subject>Low resistance</subject><subject>Metallizing</subject><subject>Metals</subject><subject>Nanophotonic resistive switch</subject><subject>Optical devices</subject><subject>Optical imaging</subject><subject>Optical pumping</subject><subject>Optical switches</subject><subject>Optical switching</subject><subject>plasmonic waveguide</subject><subject>Silicon</subject><subject>Switches</subject><issn>0733-8724</issn><issn>1558-2213</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2021</creationdate><recordtype>article</recordtype><recordid>eNo9kEtLAzEAhIMoWKt3wUvA89Y8N8mxlPpipWArHkM2ydqUtVuTVKm_3i0tnubyzQx8AFxjNMIYqbvnajEiiOARRQorgU7AAHMuC0IwPQUDJCgtpCDsHFyktEIIMybFAMyr8LHMcJxSSNk7OG29zbErXnw2bRt-TQ7dGoY1fPV7Inx7OP8J2S7he8hLONvkYE0Lx9b6fqIObci7S3DWmDb5q2MOwdv9dDF5LKrZw9NkXBWWKJwLZx01lPGaS2G9sE4x7jC3FDtTU8FLUjYIOWkbhoVsWM0c9cwgJRvslDF0CG4Pu5vYfW19ynrVbeO6v9SEC44pIpz3FDpQNnYpRd_oTQyfJu40RnqvTvfq9F6dPqrrKzeHSvDe_-OKlayUhP4BZYhq0w</recordid><startdate>20210915</startdate><enddate>20210915</enddate><creator>Singh, Lalit</creator><creator>Sulabh</creator><creator>Kaushik, Vishal</creator><creator>Rajput, Swati</creator><creator>Mishra, Rahul Dev</creator><creator>Kumar, Mukesh</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope><orcidid>https://orcid.org/0000-0002-6537-1246</orcidid><orcidid>https://orcid.org/0000-0001-6197-5977</orcidid><orcidid>https://orcid.org/0000-0002-3212-8485</orcidid><orcidid>https://orcid.org/0000-0003-3708-2014</orcidid><orcidid>https://orcid.org/0000-0001-8406-4535</orcidid></search><sort><creationdate>20210915</creationdate><title>Light Assisted Electro-Metallization in Resistive Switch With Optical Accessibility</title><author>Singh, Lalit ; Sulabh ; Kaushik, Vishal ; Rajput, Swati ; Mishra, Rahul Dev ; Kumar, Mukesh</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c291t-dcd3a345b587ce7cd945d15c31dab375626f00d8cf4178f4b4d3e4a098f1d9aa3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2021</creationdate><topic>Current carriers</topic><topic>Electrodes</topic><topic>High resistance</topic><topic>integrated photonics</topic><topic>Ions</topic><topic>Low resistance</topic><topic>Metallizing</topic><topic>Metals</topic><topic>Nanophotonic resistive switch</topic><topic>Optical devices</topic><topic>Optical imaging</topic><topic>Optical pumping</topic><topic>Optical switches</topic><topic>Optical switching</topic><topic>plasmonic waveguide</topic><topic>Silicon</topic><topic>Switches</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Singh, Lalit</creatorcontrib><creatorcontrib>Sulabh</creatorcontrib><creatorcontrib>Kaushik, Vishal</creatorcontrib><creatorcontrib>Rajput, Swati</creatorcontrib><creatorcontrib>Mishra, Rahul Dev</creatorcontrib><creatorcontrib>Kumar, Mukesh</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005–Present</collection><collection>IEEE All-Society Periodicals Package (ASPP) Online</collection><collection>IEEE Xplore</collection><collection>CrossRef</collection><collection>Electronics &amp; Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of lightwave technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Singh, Lalit</au><au>Sulabh</au><au>Kaushik, Vishal</au><au>Rajput, Swati</au><au>Mishra, Rahul Dev</au><au>Kumar, Mukesh</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Light Assisted Electro-Metallization in Resistive Switch With Optical Accessibility</atitle><jtitle>Journal of lightwave technology</jtitle><stitle>JLT</stitle><date>2021-09-15</date><risdate>2021</risdate><volume>39</volume><issue>18</issue><spage>5869</spage><epage>5874</epage><pages>5869-5874</pages><issn>0733-8724</issn><eissn>1558-2213</eissn><coden>JLTEDG</coden><abstract><![CDATA[An optically assisted electrically writable non-volatile nanophotonic resistive switch based on silicon is proposed with an optical readout capability. The proposed scheme also address the issue of undesired current overshoot in resistive switches. Optical assistance is provided with the blue pump light which leads to the photogenrated charge carriers in the active <inline-formula><tex-math notation="LaTeX">TiO_{2}</tex-math></inline-formula> layer to lower the set voltage and to improve the endurance of the device. A large hysteresis of the current loop in presence of a blue wavelength of light at lower voltages is observed with the proposed three-layered device of Ag/<inline-formula><tex-math notation="LaTeX">TiO_{2}</tex-math></inline-formula>/p-Si. The electrical resistive state of the device is readout at 1550-nm of wavelength with an optical extinction ratio of 16 dB for 1 mm long device. The optical guidance with the formation (low resistance state) and dissolution (high resistance state) of conductive path filament in the active layer of <inline-formula><tex-math notation="LaTeX">TiO_{2}</tex-math></inline-formula> is also discussed. The proposed nanophotonic functionality can be useful in realizing ultra-compact on-chip devices for optical switching, modulation and neuromorphic computing.]]></abstract><cop>New York</cop><pub>IEEE</pub><doi>10.1109/JLT.2021.3091970</doi><tpages>6</tpages><orcidid>https://orcid.org/0000-0002-6537-1246</orcidid><orcidid>https://orcid.org/0000-0001-6197-5977</orcidid><orcidid>https://orcid.org/0000-0002-3212-8485</orcidid><orcidid>https://orcid.org/0000-0003-3708-2014</orcidid><orcidid>https://orcid.org/0000-0001-8406-4535</orcidid></addata></record>
fulltext fulltext
identifier ISSN: 0733-8724
ispartof Journal of lightwave technology, 2021-09, Vol.39 (18), p.5869-5874
issn 0733-8724
1558-2213
language eng
recordid cdi_ieee_primary_9464682
source IEEE Xplore (Online service)
subjects Current carriers
Electrodes
High resistance
integrated photonics
Ions
Low resistance
Metallizing
Metals
Nanophotonic resistive switch
Optical devices
Optical imaging
Optical pumping
Optical switches
Optical switching
plasmonic waveguide
Silicon
Switches
title Light Assisted Electro-Metallization in Resistive Switch With Optical Accessibility
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-28T02%3A04%3A21IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_ieee_&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Light%20Assisted%20Electro-Metallization%20in%20Resistive%20Switch%20With%20Optical%20Accessibility&rft.jtitle=Journal%20of%20lightwave%20technology&rft.au=Singh,%20Lalit&rft.date=2021-09-15&rft.volume=39&rft.issue=18&rft.spage=5869&rft.epage=5874&rft.pages=5869-5874&rft.issn=0733-8724&rft.eissn=1558-2213&rft.coden=JLTEDG&rft_id=info:doi/10.1109/JLT.2021.3091970&rft_dat=%3Cproquest_ieee_%3E2575130255%3C/proquest_ieee_%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c291t-dcd3a345b587ce7cd945d15c31dab375626f00d8cf4178f4b4d3e4a098f1d9aa3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=2575130255&rft_id=info:pmid/&rft_ieee_id=9464682&rfr_iscdi=true