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Sub-mA Threshold Current Vertical Cavity Surface Emitting Lasers with a Simple Fabrication Process
sub-mA threshold currents are achieved for VCSELs using a simplified fabrication process which employs etched oxidation-vias for definition of the VCSEL aperture, as well as ease in formation of a bond pad without the need for bisbenzocyclobutane planarisation.
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| Language: | English |
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| creator | Baker, Jack Gillgrass, Sara Allford, Craig P. Hentschel, Curtis Davies, J. Iwan Shutts, Samuel Smowton, Peter M. |
| description | sub-mA threshold currents are achieved for VCSELs using a simplified fabrication process which employs etched oxidation-vias for definition of the VCSEL aperture, as well as ease in formation of a bond pad without the need for bisbenzocyclobutane planarisation. |
| doi_str_mv | 10.1109/IPC48725.2021.9592977 |
| format | conference_proceeding |
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| fulltext | fulltext_linktorsrc |
| identifier | EISSN: 2575-274X |
| ispartof | 2021 IEEE Photonics Conference (IPC), 2021, p.1-2 |
| issn | 2575-274X |
| language | eng |
| recordid | cdi_ieee_primary_9592977 |
| source | IEEE Xplore All Conference Series |
| subjects | Apertures Conferences Fabrication manufacturing Photonics Planarization Threshold current VCSEL Vertical cavity surface emitting lasers |
| title | Sub-mA Threshold Current Vertical Cavity Surface Emitting Lasers with a Simple Fabrication Process |
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