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Contact Fail Monitoring with an Epi Resistance Test Structure for 7nm FinFET Product

This paper describes a test site and yield issues in FinFET product. We present the test structure and the early failure detection method for 7nm FinFET product.

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Bibliographic Details
Main Authors: Lee, C.H., Jeong, B.W., Wu, S., Kim, M., Chen, X., Onishi, K., Manya, C., Anastos, L., Sim, J., Angyal, M.
Format: Conference Proceeding
Language:English
Subjects:
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Description
Summary:This paper describes a test site and yield issues in FinFET product. We present the test structure and the early failure detection method for 7nm FinFET product.
ISSN:2158-1029
DOI:10.1109/ICMTS50340.2022.9898262