Metal Organic chemical Vapor Deposition of (Ba, Sr)RuO3 oxide electrode for (Ba, Sr)TiO3 using nozzle type injector

• Published in: Ferroelectrics 2001-01, Vol.260 (1), p.105-111
• Main Authors: Park, Jeong-Hee, Kang, Joong-Seo, Kim, Young-Bae, Choi, Duck-Kyun, Han, Young-Ki, Yang, Doo-Young, Oh, Ki-Young
• Format: Article
• Language: English
• Subjects: (Ba, Sr)RuO; (Ba, Sr)TiO; LDS; MOCVD; Nozzle type injector
• ISSN: 0015-0193; 1563-5112
• DOI: 10.1080/00150190108016002

The oxide electrode (Ba, Sr)RuO 3 , which enhances the property for (Ba, Sr)TiO 3 film owing to its similarity in structure and chemical composition, was deposited on a 4 inch p-type Si wafer by Metal Organic Chemical Vapor Deposition (MOCVD). Instead of a shower head, a quartz nozzle was used for injecting source, which showed effective large area uniformity. Liquid delivery system (LDS) and vaporization cell were utilized for the delivery and vaporization of single cocktail source, respectively. The source feeding rate was controlled by Liquid Mass Flow Controller(LMFC), Ba(TMHD) 2 , Sr(TMHD) 2 , Ru(TMHD) 3 precursors and solvent [1-EtylePiPerdine(C 7 H 15 N)] were mixed together for single cocktail source. Deposition parameters such as the oxygen flow and the source flow rate were sensitive to phase formation, resistivity, and the composition ratio of (Ba, Sr)RuO 3 films. Highly (110)-textured (Ba, Sr)RuO 3 film was obtained when Ar/O 2 ratio of 200/120 seem at 0.05 cc/min of the source flow rate. The process window of stoichiometric composition of BSR film was observed when the source flow rate was 0.075-0.1 cc/min. Oxygen annealing of (Ba, Sr)RuO 3 films improved the properties of the films without changing the (110)texture and the resistivity and surface roughness were 500μΩcm and 12.7 Å, respectively.