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PZT capacitors using IrO2 electrode by RF magnetron sputtering
RF magnetron sputtered Pb(Zr x , Ti 1-x )O 3 [PZT] films were prepared on IrO 2 /SiO 2 /Si and Pt/IrO 2 /SiO 2 /Si substrates using the ceramic PZT target with Pb 1.1 (Zr 0.52 Ti 0.48 )O 3 composition. In order to obtain single perovskite phase, PZT film was sputtered at room temperature under Ar pl...
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Published in: | Integrated ferroelectrics 1998-01, Vol.21 (1-4), p.511-519 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Subjects: | |
Online Access: | Get full text |
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Summary: | RF magnetron sputtered Pb(Zr
x
, Ti
1-x
)O
3
[PZT] films were prepared on IrO
2
/SiO
2
/Si and Pt/IrO
2
/SiO
2
/Si substrates using the ceramic PZT target with Pb
1.1
(Zr
0.52
Ti
0.48
)O
3
composition. In order to obtain single perovskite phase, PZT film was sputtered at room temperature under Ar plasma and followed by high temperature annealing under oxygen atmosphere. In case of Pt/PZT/IrO
2
capacitor, Δ P (=P*-P∧) was decreased with oxygen annealing temperature. However, it was increased in Pt/PZT/Pt/IrO
2
capacitor. Leakage current density of Pt/PZT/Pt/IrO
2
capacitor, which was used for improving leakage characteristics, was about 10
-2
A/cm
−2
order lower than that of Pt/PZT/IrO
2
capacitor. Leakage current density of Pt/PZT/Pt/IrO
2
capacitor annealed at 700°C was 6.6x10
-6
A/cm
2
. From the fatigue test, Pt/PZT/IrO
2
capacitor annealed at 650°C and Pt/PZT/Pt/IrO
2
capacitor annealed at 700°C showed 3% and 12% degradation of Δ P after 5×10
10
fatigue cycles, respectively. |
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ISSN: | 1058-4587 1607-8489 |
DOI: | 10.1080/10584589808202091 |