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Electrical properties of Y1-based ferroelectric gate MOS capacitors for nonvolatile memory applications
Ferroelectric gate MOS capacitors using the "Y-1" family of ferroelectric materials were evaluated. The capacitors were formed by connecting the ferroelectric capacitor and the MIS capacitor in series. The experimental results show the dependence of the memory window on the ferroelectric/i...
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Published in: | Integrated ferroelectrics 1999-11, Vol.27 (1-4), p.19-29 |
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Main Authors: | , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Ferroelectric gate MOS capacitors using the "Y-1" family of ferroelectric materials were evaluated. The capacitors were formed by connecting the ferroelectric capacitor and the MIS capacitor in series. The experimental results show the dependence of the memory window on the ferroelectric/insulator capacitance ratios, which gives some useful information on the design of MFSFETs. |
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ISSN: | 1058-4587 1607-8489 |
DOI: | 10.1080/10584589908228452 |