Interface location-controlled indium gallium zinc oxide thin-film transistors using a solution process

The role of an interface as an electron-trapping layer in double-stacked indium gallium zinc oxide (IGZO) thin-film transistors (TFTs) was investigated and interface location-controlled (ILC) IGZO TFTs were introduced. In the ILC TFTs, the thickness of the top and bottom IGZO layers is controlled to...

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Bibliographic Details
Published in:Journal of physics. D, Applied physics Applied physics, 2016-03, Vol.49 (8), p.85301-85306
Main Authors: Na, Jae Won, Kim, Yeong-gyu, Jung, Tae Soo, Tak, Young Jun, Park, Sung Pyo, Park, Jeong Woo, Kim, Si Joon, Kim, Hyun Jae
Format: Article
Language:English
Subjects:
Gallium
Gates
IGZO
Indium
Insulators
interface
oxide TFT
Semiconductor devices
Thin film transistors
Voltage
Zinc oxide
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Summary:The role of an interface as an electron-trapping layer in double-stacked indium gallium zinc oxide (IGZO) thin-film transistors (TFTs) was investigated and interface location-controlled (ILC) IGZO TFTs were introduced. In the ILC TFTs, the thickness of the top and bottom IGZO layers is controlled to change the location of the interface layer. The system exhibited improved electrical characteristics as the location of the interface layer moved further from the gate insulator: field-effect mobility increased from 0.36 to 2.17 cm2 V−1 s−1, and the on-current increased from 2.43  ×  10−5 to 1.33  ×  10−4 A. The enhanced electrical characteristics are attributed to the absence of an electron-trapping interface layer in the effective channel layer where electrons are accumulated under positive gate bias voltage.
ISSN:0022-3727
1361-6463
DOI:10.1088/0022-3727/49/8/085301