Generation of microdischarges in diamond substrates

We report the generation of microdischarges in devices composed of microcrystalline diamond. Discharges were generated in device structures with microhollow cathode discharge geometries. One structure consisted of an insulating diamond wafer coated with boron-doped diamond layers on both sides. A se...

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Bibliographic Details
Published in:Plasma sources science & technology 2012-04, Vol.21 (2), p.22001-1-4
Main Authors: Mitea, S, Zeleznik, M, Bowden, M D, May, P W, Fox, N A, Hart, J N, Fowler, C, Stevens, R, Braithwaite, N StJ
Format: Article
Language:English
Subjects:
Breakdown
Conductors (devices)
Devices
Diamonds
Electric discharges
Electric potential
Exact sciences and technology
Helium
Other gas discharges
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Voltage
Wafers
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Summary:We report the generation of microdischarges in devices composed of microcrystalline diamond. Discharges were generated in device structures with microhollow cathode discharge geometries. One structure consisted of an insulating diamond wafer coated with boron-doped diamond layers on both sides. A second structure consisted of an insulating diamond wafer coated with metal layers on both sides. In each case, a single sub-millimetre hole was machined through the conductor-insulator-conductor structure. The discharges were generated in a helium atmosphere. Breakdown voltages were around 500 V and discharge currents in the range 0.1-2.5 mA were maintained by a sustaining dc voltage of 300 V.
ISSN:0963-0252
1361-6595
DOI:10.1088/0963-0252/21/2/022001