Tunable diffraction grating in flexible substrate by UV-nanoimprint lithography

The fabrication of flexible advanced devices is a very important issue that requires the hybrid integration of different nanostructured materials. In this work, we report on a new molding technique based on an improved hard UV-nanoimprint lithography process (hard UV-NIL) using a poly(dimethylsiloxa...

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Bibliographic Details
Published in:Journal of micromechanics and microengineering 2017-02, Vol.27 (2), p.25017
Main Authors: Hamouda, F, Aassime, A, Bertin, H, Gogol, P, Bartenlian, B, Dagens, B
Format: Article
Language:English
Subjects:
diffraction grating
flexible substrate
hard UV-NIL
PDMS
sacrificial layer
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Summary:The fabrication of flexible advanced devices is a very important issue that requires the hybrid integration of different nanostructured materials. In this work, we report on a new molding technique based on an improved hard UV-nanoimprint lithography process (hard UV-NIL) using a poly(dimethylsiloxane) (PDMS) film. The large-scale integration of a high-quality nanostructured gold pattern in PDMS is made possible with the use of an inorganic sacrificial layer soluble in hydrogen peroxide. A tunable diffraction gold stripe grating has been fabricated by transferring a 1 cm2 stripe grating from a rigid silicon substrate to a flexible PDMS substrate. As a result, we successfully demonstrate diffraction grating optical tunability when mechanical tension is applied.
ISSN:0960-1317
1361-6439
DOI:10.1088/1361-6439/aa5404