DMD maskless digital lithography based on stepwise rotary stitching

• Published in: Journal of micromechanics and microengineering 2023-04, Vol.33 (4), p.45003
• Main Authors: Yuan, Qixiang, Liu, Chunxia, Huang, Long, Zhao, Shaoqing, Wang, Zhengxiao, Zhang, Han, Liu, Minzhe, Jia, Zhongqing, Zhai, Ruizhan, Lu, Zifeng, Liu, Hua
• Format: Article
• Language: English
• Subjects: DMD; double-exposure; errors compensation; pixel-to-pixel mapping
• ISSN: 0960-1317; 1361-6439
• DOI: 10.1088/1361-6439/acba27

Diffractive optical elements (DOEs) with rotationally symmetric phase distribution are mainly produced by laser direct writing technique in a polar coordinate system, which has slow processing speed and limited fabrication area. In this paper, we propose a digital micro-mirror device maskless digital lithography technique based on stepwise rotary stitching. DOEs with rotationally symmetric phase distribution are fabricated by exposure of stitching units and rotation of rotary tables. Then, different stitching units are designed to compensate for the errors caused by the accuracy of the rotary table. Finally, the high quality DOEs are produced by the double-exposure method. When increasing the fabrication area, significantly improves the saw-tooth of the lithography pattern edge while reducing misalignment and overlap of stitching caused by residual errors. The diameter of the fabricated Fresnel zone plate was increased from 5.25 mm to 11.40 mm, and the fabrication area was 4.72 times larger than conventional lithography. The stitching error of 18.95 μ m has been eliminated after optimization, and the pixelization has been smoothed. The diffraction results show that the method not only can produce large area and high-quality diffraction elements but also greatly reduce the processing cost.